Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MME | P08473 | 5/20 | 0.40 |
| ▸ | ACE | P12821 | 4/20 | 0.40 |
| ▸ | ACE2 | Q9BYF1 | 4/20 | 0.40 |
| ▸ | CPA1 | P15085 | 3/20 | 0.40 |
| ▸ | PTGS1 | P23219 | 4/20 | 0.39 |
| ▸ | PTGS2 | P35354 | 4/20 | 0.39 |
| ▸ | LMNA | P02545 | 2/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.39 |
| ▸ | AKR1C3 | P42330 | 2/20 | 0.39 |
| ▸ | CXCR1 | P25024 | 2/20 | 0.39 |
| ▸ | CXCR2 | P25025 | 2/20 | 0.39 |
| ▸ | ALOX5 | P09917 | 2/20 | 0.39 |
| ▸ | ALB | P02768 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | RARB | P10826 | 1/20 | 0.39 |
| ▸ | ADRB3 | P13945 | 1/20 | 0.39 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | HTR2A | P28223 | 1/20 | 0.39 |
| ▸ | NR1I3 | Q14994 | 1/20 | 0.39 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL31473545 | 0.82 | PTPN1 (0.53) | CYP2C9PTPN1 | |
| Biphenyl SCHEMBL27617904 | 0.81 | TAAR1 (0.50) | PTGS1LMNATSHRPTPN1 | |
| Biphenyl SCHEMBL1993781 | 0.79 | PTPN1 (0.44) | LMNAPTPN1 | |
| Biphenyl SCHEMBL27775707 | 0.77 | MMP3 (0.47) | LMNAESR1PTPN1 | |
| Biphenyl SCHEMBL113983 | 0.77 | CXCR2 (0.43) | CXCR1CXCR2 | |
| Biphenyl SCHEMBL1992773 | 0.77 | PTPN1 (0.45) | PTPN1 | |
| Biphenyl SCHEMBL27838332 | 0.77 | PTPN1 (0.53) | TSHRPTPN1 | |
| Biphenyl SCHEMBL710434 | 0.76 | CXCR2 (0.42) | CXCR1CXCR2 | |
| Biphenyl SCHEMBL4511310 | 0.76 | CXCR2 (0.42) | PTGS1PTGS2LMNACYP2C9AKR1C3 | |
| Biphenyl SCHEMBL1998395 | 0.75 | BACE1 (0.43) | PTPN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026107261-A1 | PURIFICATION OF PHOTORESIST POLYMER BY SURFACE-MODIFIED POROUS POLYETHYLENE MEMBRANE | ENTEGRIS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| US-7399570-B2 | Water-soluble negative photoresist polymer and composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-07-15 | — | — | US | claimed |
| US-7361447-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-04-22 | — | — | US | claimed |
| US-7338742-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2008-03-04 | — | — | US | claimed |
| US-7282318-B2 | Photoresist composition for EUV and method for forming photoresist pattern using the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-16 | — | — | US | claimed |
| US-7279256-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2007-10-09 | — | — | US | claimed |
| US-7270934-B2 | Water-soluble negative photoresist polymer, composition containing the same, and method of forming a photoresist pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2007-09-18 | — | — | US | claimed |
| US-20070154837-A1 | Composition for hard mask and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-07-05 | — | — | US | claimed |
| US-7129023-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-10-31 | — | — | US | claimed |
| US-7083893-B2 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2006-08-01 | — | — | US | claimed |
| US-6849375-B2 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-01 | — | — | US | claimed |
| US-20040265743-A1 | Photoresist polymer and photoresist composition including the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| US-20040265735-A1 | Photoresist polymer and photoresist composition containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2004-12-30 | — | — | US | claimed |
| US-6818376-B2 | OVERCOATING SEMICONDUCTOR SUBSTRATE WITH PHOTOSENSITIVE POLYMER; EXPOSURE TO RADIATION IN PRESENCE OF ACID GENERATOR | HYNIX SEMICONDUCTOR INC. (KR) | 2004-11-16 | — | — | US | claimed |
| US-6806025-B2 | FLUORINATED FUSED RING MONOMERS AND POLYMERS; MAYBE COPOLYMERIZED WITH A SUBSTITUTED MALEIMIDE AND/OR A TRIFLUOROMETHYL ACRYLATE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-10-19 | — | — | US | claimed |
| US-20030091927-A1 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | HYNIX SEMICONDUCTOR INC. (KR) | 2003-05-15 | — | — | US | claimed |
| US-20030022101-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | INTELLECTUAL DISCOVERY CO. LTD. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030022100-A1 | Photoresist monomers, polymers thereof and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030003379-A1 | Photoresist monomers, polymers thereof and photoresist compositons containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-02 | — | — | US | claimed |
| US-20020160301-A1 | Cross-linker monomer comprising double bond and photoresist copolymer containing the same | HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) | 2002-10-31 | — | — | US | claimed |