Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CXCR2 | P25025 | 2/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | PPARG | P37231 | 10/20 | 0.41 |
| ▸ | PPARA | Q07869 | 8/20 | 0.41 |
| ▸ | CXCR1 | P25024 | 1/20 | 0.41 |
| ▸ | PPARD | Q03181 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Biphenyl SCHEMBL113983 | 0.99 | CXCR2 (0.43) | CXCR2CA1CA2CA9PPARG | |
| Biphenyl SCHEMBL4511310 | 0.97 | CXCR2 (0.42) | CXCR2CA1CA2CA9PPARG | |
| Hydrogen Sulfide SCHEMBL27492503 | 0.93 | CXCR2 (0.47) | CXCR2CXCR1ALDH1A1 | |
| SCHEMBL4535172 | 0.91 | CXCR2 (0.48) | CXCR2CXCR1ALDH1A1 | |
| SCHEMBL24360466 | 0.79 | CA2 (0.62) | CXCR2CA1CA2CA9CXCR1 | |
| SCHEMBL5532552 | 0.79 | CA2 (0.62) | CXCR2CA1CA2CA9CXCR1 | |
| Biphenyl SCHEMBL713552 | 0.79 | BACE1 (0.51) | CXCR2CA1CA2CA9PPARG | |
| Biphenyl SCHEMBL709602 | 0.79 | CA2 (0.49) | CXCR2CA1CA2CA9PPARG | |
| SCHEMBL8687304 | 0.78 | CXCR2 (0.45) | CXCR2CA2PPARGPPARACXCR1 | |
| SCHEMBL8687306 | 0.78 | CXCR2 (0.45) | CXCR2CA2PPARGPPARACXCR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7994050-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. (KR) | 2011-08-09 | — | — | US | claimed |
| US-20100311239-A1 | Method for forming dual damascene pattern | LEE KI LYOUNG | 2010-12-09 | — | — | US | claimed |
| US-7811929-B2 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR, INC. (KR) | 2010-10-12 | — | — | US | claimed |
| US-7449538-B2 | Hard mask composition and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2008-11-11 | — | — | US | claimed |
| US-20080268641-A1 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. | 2008-10-30 | — | — | US | claimed |
| US-20070154838-A1 | Hard Mask Composition and Method for Manufacturing Semiconductor Device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-07-05 | — | — | US | claimed |
| CN-117866135-B | Self-crosslinking polymer and bottom anti-reflection coating composition as well as preparation method and application thereof | 厦门恒坤新材料科技股份有限公司 | 2025-01-24 | — | — | CN | disclosed |
| CN-118930721-A | Bottom anti-reflection film resin and composition, preparation method and pattern forming method thereof | 厦门恒坤新材料科技股份有限公司 | 2024-11-12 | — | — | CN | disclosed |
| CN-118818901-A | KrF negative photoresist and preparation method and patterning forming method thereof | 厦门恒坤新材料科技股份有限公司 | 2024-10-22 | — | — | CN | disclosed |
| CN-116082914-B | Organic anti-reflection coating composition, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2024-04-30 | — | — | CN | disclosed |
| CN-117866135-A | Self-crosslinking polymer and bottom anti-reflection coating composition as well as preparation method and application thereof | 厦门恒坤新材料科技股份有限公司 | 2024-04-12 | — | — | CN | disclosed |
| CN-115948095-B | Anti-reflection coating composition, preparation method thereof and photoresist pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-116478328-A | Silicon-containing polymer and bottom anti-reflection coating composition and preparation method thereof | 厦门恒坤新材料科技股份有限公司 | 2023-07-25 | — | — | CN | disclosed |
| US-20090023093-A1 | ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2009-01-22 | — | — | US | disclosed |
| EP-2017274-A1 | Acid-amplifier having acetal group and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD (KR) | 2009-01-21 | — | — | EP | disclosed |
| US-20080305430-A1 | PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2008-12-11 | — | — | US | disclosed |
| EP-2000853-A2 | Photo-sensitive compound and photoresist composition including the same | DONGJIN SEMICHEM CO., LTD (KR) | 2008-12-10 | — | — | EP | disclosed |
| US-7449538-B2 | Hard mask composition and method for manufacturing semiconductor device | HYNIX SEMICONDUCTOR INC. (KR) | 2008-11-11 | — | — | US | disclosed |
| US-20080268641-A1 | Method for forming dual damascene pattern | HYNIX SEMICONDUCTOR INC. | 2008-10-30 | — | — | US | disclosed |
| US-20070154838-A1 | Hard Mask Composition and Method for Manufacturing Semiconductor Device | HYNIX SEMICONDUCTOR INC. (KR) | 2007-07-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080305430-A1 | PHOTO-SENSITIVE COMPOUND AND PHOTORESIST COMPOSITION INCLUDING THE SAME | CRY1, CRY2, CYP1A1 | CXCR2 1683/4885CA1 3359/4885CA2 3966/4885 |
| US-20090023093-A1 | ACID-AMPLIFIER HAVING ACETAL GROUP AND PHOTORESIST COMPOSITION INCLUDING THE SAME | ASIC1, RARB, RARA | CXCR2 1879/4885CA1 295/4885CA2 991/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.