Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | DRD2 | P14416 | 4/20 | 0.36 |
| ▸ | DRD3 | P35462 | 3/20 | 0.36 |
| ▸ | DRD1 | P21728 | 1/20 | 0.36 |
| ▸ | DRD4 | P21917 | 1/20 | 0.36 |
| ▸ | DRD5 | P21918 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | RXRA | P19793 | 1/20 | 0.36 |
| ▸ | RXRB | P28702 | 1/20 | 0.36 |
| ▸ | RXRG | P48443 | 1/20 | 0.36 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.35 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.35 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29414132 | 0.91 | TDP1 (0.44) | TDP1ATMDRD2DRD3DRD1 | |
| SCHEMBL1997201 | 0.91 | TDP1 (0.44) | TDP1ATMDRD2DRD3DRD1 | |
| Hydrogen Sulfide SCHEMBL4225727 | 0.89 | TDP1 (0.43) | TDP1ATMDRD2DRD3DRD1 | |
| Iodide SCHEMBL6927596 | 0.89 | TDP1 (0.43) | TDP1ATMDRD2DRD3DRD1 | |
| Tromethamine SCHEMBL5471107 | 0.78 | RXRA (0.41) | TDP1ATMDRD2DRD3DRD1 | |
| Diphenylsulfane SCHEMBL2191112 | 0.78 | CA1 (0.50) | TDP1ALDH1A1GAAHSD11B1HSD17B3 | |
| Diphenylsulfane SCHEMBL23706320 | 0.78 | PTGS2 (0.40) | DRD2DRD3DRD1DRD4DRD5 | |
| Iodide SCHEMBL8736611 | 0.78 | DRD2 (0.38) | TDP1ATMDRD2DRD3DRD1 | |
| SCHEMBL6207099 | 0.77 | PPARG (0.43) | DRD2DRD3DRD1DRD4DRD5 | |
| Diphenylsulfane SCHEMBL671233 | 0.77 | ALDH1A1 (0.40) | TDP1DRD2DRD3DRD1DRD4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | claimed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | claimed |
| US-7960095-B2 | Combination of base additives including a room temperature solid base, and a liquid low vapor pressure base; for chromium-containing layers used in mask-making | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-06-14 | — | — | US | disclosed |
| US-20080227030-A1 | Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-09-18 | — | — | US | disclosed |
| US-7300741-B2 | For printing features having a dimension of about 30 nm or less; resist is developable in an aqueous alkaline developer | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-27 | — | — | US | disclosed |
| US-20070269736-A1 | NEW SUB 40 NM RESOLUTION Si CONTAINING RESIST SYSTEM | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-11-22 | — | — | US | disclosed |
| US-20070248908-A1 | ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RESOLUTION | INTERNATIONAL BUSINESS MACHINES (US) | 2007-10-25 | — | — | US | disclosed |
| US-7090963-B2 | Process for forming features of 50 nm or less half-pitch with chemically amplified resist imaging | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2006-08-15 | — | — | US | disclosed |
| US-20040265747-A1 | PROCESS FOR FORMING FEATURES OF 50 NM OR LESS HALF-PITCH WITH CHEMICALLY AMPLIFIED RESIST IMAGING | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2004-12-30 | — | — | US | disclosed |