SCHEMBL1997201

SCHEMBL1997201

CC(C)(C)c1ccccc1OS(=O)(=O)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.44
ATM Q13315 1/20 0.44
ALDH1A1 P00352 3/20 0.41
KDM4E B2RXH2 2/20 0.41
GAA P10253 1/20 0.41
RXRA P19793 1/20 0.41
RXRB P28702 1/20 0.41
RXRG P48443 1/20 0.41
DRD2 P14416 4/20 0.40
DRD3 P35462 3/20 0.40
DRD1 P21728 1/20 0.40
DRD4 P21917 1/20 0.40
DRD5 P21918 1/20 0.40
HSD11B1 P28845 2/20 0.40
HSD17B3 P37058 1/20 0.40
TSHR P16473 1/20 0.39
NPSR1 Q6W5P4 1/20 0.38
ELANE P08246 1/20 0.38
HTR1D P28221 2/20 0.37
RBP4 P02753 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29414132 1.00 TDP1 (0.44) TDP1ATMALDH1A1KDM4EGAA
Hydrogen Sulfide SCHEMBL4225727 0.98 TDP1 (0.43) TDP1ATMALDH1A1KDM4EGAA
Iodide SCHEMBL6927596 0.98 TDP1 (0.43) TDP1ATMALDH1A1KDM4EGAA
Diphenylsulfane SCHEMBL1996327 0.91 TDP1 (0.38) TDP1ATMALDH1A1KDM4EGAA
Tromethamine SCHEMBL5471107 0.86 RXRA (0.41) TDP1ATMALDH1A1KDM4EGAA
Iodide SCHEMBL8736611 0.85 DRD2 (0.38) TDP1ATMALDH1A1KDM4EGAA
SCHEMBL6207099 0.85 PPARG (0.43) RXRARXRBRXRGDRD2DRD3
Iodide SCHEMBL7773907 0.84 PPARG (0.42) RXRARXRBRXRGDRD2DRD3
Iodide SCHEMBL1286189 0.83 DRD2 (0.37) TDP1ATMDRD2DRD3DRD1
SCHEMBL10179774 0.83 DRD2 (0.43) DRD2DRD3DRD1DRD4DRD5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100595673-C Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode SAMSUNG SDI CO LTD 2010-03-24 CN claimed
CN-1779570-A Positive type photosensitive paste composition for PDP electrode, PDP electrode prepared therefrom, and PDP comprising the PDP electrode SAMSUNG SDI CO LTD (KR) 2006-05-31 CN claimed
CN-1241065-C Photoresist composite with optical acid-generating agent containing optical free radical generating agent HAIRYOKSA SEMICONDUCTOR CO LTD (KR) 2006-02-08 CN claimed
CN-1221856-C Polymer and forming method of micro pattern using the same HYUNDAI ELECTRONICS IND (KR) 2005-10-05 CN claimed
CN-1146602-C Polymer and forming method of micro pattern using the same 现代电子产业株式会社 2004-04-21 CN claimed
CN-1330288-A Photoresist composite with optical acid-generating agent containing optical free radical generating agent HAIRYOKSA SEMICONDUCTOR CO LTD (KR) 2002-01-09 CN claimed
CN-1238344-A Polymer and forming method of micro pattern using the same HYUNDAI ELECTRONICS IND (KR) 1999-12-15 CN claimed
CN-1235171-A Polymer and forming method of micro pattern using the same HYUNDAI ELECTRONICS IND (KR) 1999-11-17 CN claimed
CN-109153173-A For reducing the 3 D-printing method and equipment of bubble by building plate degassing 卡本有限公司 2019-01-04 CN disclosed
US-10004701-B2 Methods and compositions for treating infection UNIVERSITY OF ROCHESTER (US) 2018-06-26 US disclosed
US-10004701-B2 Methods and compositions for treating infection UNIVERSITY OF ROCHESTER (US) 2018-06-26 US disclosed
US-10004701-B2 Methods and compositions for treating infection UNIVERSITY OF ROCHESTER (US) 2018-06-26 US disclosed
CN-108139673-A Material, preparation method and its application method comprising metal oxide AZ电子材料卢森堡有限公司 2018-06-08 CN disclosed
US-20170065540-A1 METHODS AND COMPOSITIONS FOR TREATING INFECTION UNIVERSITY OF ROCHESTER (US) 2017-03-09 US disclosed
CN-1666150-A Photosensitive composition based on polycyclic polymer SUMITOMO BAKELITE CO (JP) 2005-09-07 CN disclosed
CN-1146602-C Polymer and forming method of micro pattern using the same 现代电子产业株式会社 2004-04-21 CN disclosed
CN-1330288-A Photoresist composite with optical acid-generating agent containing optical free radical generating agent HAIRYOKSA SEMICONDUCTOR CO LTD (KR) 2002-01-09 CN disclosed
US-6080870-A Biaryl substituted imidazole compounds useful as farnesyl-protein transferase inhibitors MERCK & CO., INC. (US) 2000-06-27 US disclosed
CN-1238344-A Polymer and forming method of micro pattern using the same HYUNDAI ELECTRONICS IND (KR) 1999-12-15 CN disclosed
CN-1235171-A Polymer and forming method of micro pattern using the same HYUNDAI ELECTRONICS IND (KR) 1999-11-17 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170065540-A1 METHODS AND COMPOSITIONS FOR TREATING INFECTION MMP8, IFNG, MPO TDP1 4615/4885ATM 2183/4885ALDH1A1 2568/4885
US-10004701-B2 Methods and compositions for treating infection MMP8, IFNG, MPO TDP1 4615/4885ATM 2183/4885ALDH1A1 2568/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.