Tetraphenylphosphonium

Tetraphenylphosphonium

SCHEMBL2000466

O=C(O)c1ccccc1.O=C(O)c1ccccc1.O=C(O)c1ccccc1.O=C(O)c1ccccc1.[O-]B([O-])[O-].c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1.c1ccc([P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.58

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D

The experimentally established mechanism targets of Tetraphenylphosphonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.58
DAO P14920 1/20 0.58
NAPRT Q6XQN6 1/20 0.58
CES2 O00748 3/20 0.50
CES1 P23141 3/20 0.50
SRD5A2 P31213 2/20 0.50
CA2 P00918 2/20 0.46
CA1 P00915 1/20 0.46
TP53 P04637 1/20 0.44
CA4 P22748 1/20 0.41
ALDH1A1 P00352 2/20 0.41
TRPA1 O75762 1/20 0.41
CYP2C9 P11712 2/20 0.40
CYP2C8 P10632 1/20 0.40
KMO O15229 1/20 0.39
CYP1A2 P05177 1/20 0.39
HPGD P15428 1/20 0.39
HSD17B10 Q99714 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetraphenylphosphonium SCHEMBL2000464 0.86 CA2 (0.61) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL28946502 0.84 TSHR (0.74) TSHRDAONAPRTCES2CES1
Iodide SCHEMBL10901409 0.83 TSHR (0.56) TSHRDAONAPRTCES2CES1
Tetraphenylphosphonium SCHEMBL6567177 0.82 HIF1A (0.41) TSHRCA4ALDH1A1CYP1A2HPGD
Tetraphenylphosphonium SCHEMBL4428554 0.82 HIF1A (0.41) TSHRCA4ALDH1A1CYP1A2HPGD
Tetraphenylphosphonium SCHEMBL7172885 0.79 HIF1A (0.39) TSHRALDH1A1CYP1A2HPGDHSD17B10
Tetraphenylphosphonium SCHEMBL1032707 0.78 CA2 (0.70) TSHRDAONAPRTCES2CES1
Tetraphenylphosphonium SCHEMBL7172888 0.77 CA4 (0.39) TSHRCA2CA1CA4ALDH1A1
Tetraphenylphosphonium SCHEMBL4388860 0.77 CA2 (0.46) TSHRDAONAPRTCES2CES1
Benzoic Acid SCHEMBL975929 0.76 TSHR (1.00) TSHRDAONAPRTCES2CES1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9464163-B2 Novolak resin containing hexafluoroisopropanol group, method for producing same, and composition of same CENTRAL GLASS COMPANY, LIMITED (JP) 2016-10-11 US disclosed
US-20150337077-A1 Novolak Resin Containing Hexafluoroisopropanol Group, Method for Producing Same, and Composition of Same CENTRAL GLASS COMPANY, LIMITED (JP) 2015-11-26 US disclosed
EP-2515329-A1 METHOD FOR PRODUCING ELECTRONIC DEVICE, ELECTRONIC DEVICE, METHOD FOR PRODUCING ELECTRONIC DEVICE PACKAGE, AND ELECTRONIC DEVICE PACKAGE Sumitomo Bakelite Co., Ltd. (JP) 2012-10-24 EP disclosed
EP-2506298-A1 PRODUCTION METHOD FOR ELECTRONIC DEVICE, ELECTRONIC DEVICE, PRODUCTION METHOD FOR ELECTRONIC DEVICE PACKAGE, AND ELECTRONIC DEVICE PACKAGE Sumitomo Bakelite Company Limited (JP) 2012-10-03 EP disclosed
US-20120228782-A1 METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, METHOD FOR MANUFACTURING ELECTRONIC DEVICE PACKAGE AND ELECTRONIC DEVICE PACKAGE Sumitomo Bakelite Co, Ltd (JP) 2012-09-13 US disclosed
CN-101223207-B Epoxy resin composition and semiconductor device SUMITOMO BAKELITE CO 2012-02-29 CN disclosed
US-20110147954-A1 SEMICONDUCTOR DEVICE, AND RESIN COMPOSITION USED FOR SEMICONDUCTOR DEVICE SUMITOMO BAKELITE CO., LTD. (JP) 2011-06-23 US disclosed
US-7612458-B2 blends contains a phenolic resin, a curing accelerator and an inorganic filler silicon dioxide and alumina; excellent flowability and an excellent moldability, solder reflow resistance SUMITOMO BAKELITE COMPANY LIMITED (JP) 2009-11-03 US disclosed
US-7605213-B2 flame resistance, good fluidity and adequately higher solder-reflow resistance to allow for the use of a lead-free solder without a flame retardant; halogen-free SUMITOMO BAKELITE CO., LTD. (JP) 2009-10-20 US disclosed
CN-101223207-A Epoxy resin composition and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-07-16 CN disclosed
US-20070027273-A1 flame resistance, good fluidity and adequately higher solder-reflow resistance to allow for the use of a lead-free solder without a flame retardant; halogen-free SUMITOMO BAKELITE CO., LTD. (JP) 2007-02-01 US disclosed
EP-1191062-B1 Epoxy resin composition and semiconductor devices SUMITOMO BAKELITE CO (JP) 2006-11-15 EP disclosed
US-20060228561-A1 blends contains a phenolic resin, a curing accelerator and an inorganic filler silicon dioxide and alumina; excellent flowability and an excellent moldability, solder reflow resistance SUMITOMO BAKELITE COMPANY LIMITED (JP) 2006-10-12 US disclosed
US-20060205896-A1 Epoxy resin composition for semiconductor sealing and semiconductor device SUMITOMO BAKELITE CO., LTD. (JP) 2006-09-14 US disclosed
US-6376101-B1 BLEND OF EPOXY RESIN, PHENOL RESIN AND FILLER; ENCAPSULATING SEMICONDUCTORS SUMITOMO BAKELITE CO., LTD. (JP) 2002-04-23 US disclosed
EP-1191062-A1 Epoxy resin composition and semiconductor devices SUMITOMO BAKELITE COMPANY LIMITED (JP) 2002-03-27 EP disclosed