SCHEMBL20014047

SCHEMBL20014047

CCN(CC)c1ccc(C(=O)OC(CS(=O)(=O)O)(C(F)(F)F)C(F)(F)F)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 4/20 0.40
▸ KMT2A Q03164 4/20 0.40
▸ ALDH1A1 P00352 4/20 0.40
▸ HSP90AA1 P07900 3/20 0.40
▸ HPGD P15428 2/20 0.40
▸ L3MBTL1 Q9Y468 2/20 0.40
▸ CYP2C9 P11712 1/20 0.40
▸ CYP2C19 P33261 1/20 0.40
▸ HSD11B1 P28845 1/20 0.40
▸ TLR9 Q9NR96 1/20 0.40
▸ CNR2 P34972 1/20 0.38
▸ MAPT P10636 5/20 0.38
▸ NOX1 Q9Y5S8 2/20 0.38
▸ POLB P06746 1/20 0.38
▸ GAA P10253 1/20 0.38
▸ MCL1 Q07820 1/20 0.38
▸ HDAC3 O15379 1/20 0.38
▸ HDAC4 P56524 1/20 0.38
▸ HDAC1 Q13547 1/20 0.38
▸ HDAC7 Q8WUI4 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20014046 0.93 ESRRG (0.38) MEN1KMT2AALDH1A1HSP90AA1HPGD
SCHEMBL21504706 0.90 EGFR (0.39) L3MBTL1CYP2C19CNR2
SCHEMBL20014049 0.88 EGFR (0.41) ALDH1A1L3MBTL1CNR2POLBGAA
SCHEMBL20014045 0.87 ALDH1A1 (0.45) MEN1KMT2AALDH1A1HPGDL3MBTL1
SCHEMBL20014043 0.86 MLYCD (0.33) ALDH1A1HDAC3HDAC4HDAC1HDAC7
SCHEMBL22694292 0.81 LMNA (0.41) MEN1KMT2AALDH1A1CYP2C19MAPT
SCHEMBL25476288 0.80 PTPRB (0.32) MEN1KMT2AALDH1A1MAPTPOLB
SCHEMBL18473354 0.80 USP5 (0.38) MEN1KMT2AALDH1A1L3MBTL1CYP2C9
SCHEMBL19756115 0.80 TRPV1 (0.37) MAPT
SCHEMBL20013920 0.80 LMNA (0.41) ALDH1A1CYP2C9CYP2C19MAPTGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11022881-B2 Photoacid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-06-01 — — US disclosed
US-10754248-B2 Sulfonium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-25 — — US disclosed
US-20190324367-A1 PHOTOACID GENERATOR, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-10-24 — — US disclosed
US-10180626-B2 Sulfonium salt, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-01-15 — — US disclosed
US-20180088464-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180088464-A1 SULFONIUM SALT, RESIST COMPOSITION, AND PATTERNING PROCESS LSM14A, PAG1, EWSR1 MEN1 3909/4885KMT2A 3446/4885ALDH1A1 3760/4885
US-10180626-B2 Sulfonium salt, resist composition, and patterning process LSM14A, PAG1, EWSR1 MEN1 3909/4885KMT2A 3446/4885ALDH1A1 3760/4885
US-10754248-B2 Sulfonium salt, resist composition, and patterning process GPS1, SPIN2B, SPIN1 MEN1 3034/4885KMT2A 2505/4885ALDH1A1 2187/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

Send feedback