Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SHBG | P04278 | 1/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.36 |
| ▸ | CASP6 | P55212 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | HPGD | P15428 | 2/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | PTPN1 | P18031 | 4/20 | 0.33 |
| ▸ | PTPN2 | P17706 | 2/20 | 0.33 |
| ▸ | PTPN6 | P29350 | 2/20 | 0.33 |
| ▸ | NQO1 | P15559 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25706682 | 0.83 | SHBG (0.35) | SHBG | |
| SCHEMBL17577153 | 0.77 | SHBG (0.42) | SHBGKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL11720419 | 0.73 | SHBG (0.57) | SHBGKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL17578343 | 0.73 | TP53 (0.44) | SHBGKDM4EALDH1A1HPGDHSD17B10 | |
| SCHEMBL2679190 | 0.72 | SHBG (0.71) | SHBGKDM4ECASP6ALDH1A1HPGD | |
| SCHEMBL25636434 | 0.71 | KLF10 (0.41) | KDM4E | |
| SCHEMBL27946859 | 0.70 | SHBG (0.68) | SHBGKDM4ECASP6ALDH1A1HPGD | |
| SCHEMBL12098028 | 0.69 | PTPN1 (0.54) | PTPN1 | |
| SCHEMBL2121614 | 0.69 | PTPN1 (0.52) | KDM4EALDH1A1HPGDHSD17B10PTPN1 | |
| SCHEMBL17902715 | 0.68 | SHBG (0.50) | SHBGKDM4ECASP6PTPN1PTPN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914296-B2 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | MERCK PATENT GMBH (DE) | 2024-02-27 | — | — | US | disclosed |
| US-11914296-B2 | Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating | MERCK PATENT GMBH (DE) | 2024-02-27 | — | — | US | disclosed |
| WO-2024018957-A1 | COMPOSITION FOR FORMING RESIST UNDERLAYER FILM | 日産化学株式会社 | 2024-01-25 | — | — | WO | disclosed |
| EP-3558917-B1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2024-01-24 | — | — | EP | disclosed |
| US-11767398-B2 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life | MERCK PATENT GMBH (DE) | 2023-09-26 | — | — | US | disclosed |
| US-11767398-B2 | Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life | MERCK PATENT GMBH (DE) | 2023-09-26 | — | — | US | disclosed |
| US-20230194989-A1 | ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METHOD FOR MANUFACTURING A COATING BY IT, AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING | MERCK PATENT GMBH (DE) | 2023-06-22 | — | — | US | disclosed |
| WO-2022233919-A2 | SPIN ON METAL-ORGANIC FORMULATIONS | MERCK PATENT GMBH (DE) | 2022-11-10 | — | — | WO | disclosed |
| US-20220221794-A1 | METHOD FOR MANUFACTURING CURED FILM AND USE OF THE SAME | MERCK PATENT GMBH (DE) | 2022-07-14 | — | — | US | disclosed |
| US-11366389-B2 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | MERCK PATENT GMBH (DE) | 2022-06-21 | — | — | US | disclosed |
| US-20220025109-A1 | SPIN-ON COMPOSITIONS COMPRISING AN INORGANIC OXIDE COMPONENT AND AN ALKYNYLOXY SUBSTITUTED SPIN-ON CARBON COMPONENT USEFUL AS HARD MASKS AND FILLING MATERIALS WITH IMPROVED SHELF LIFE | MERCK PERFORMANCE MATERIALS GERMANY GMBH (DE) | 2022-01-27 | — | — | US | disclosed |
| US-20210181636-A1 | ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME | MERCK PATENT GMBH (DE) | 2021-06-17 | — | — | US | disclosed |
| US-20200401046-A1 | AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METHOD FOR MANUFACTURING A COATING BY IT, AND A METHOD FOR MANUFACTURING A DEVICE COMPRISING THE COATING | MERCK PATENT GMBH (DE) | 2020-12-24 | — | — | US | disclosed |
| US-20200044158-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2020-02-06 | — | — | US | disclosed |
| WO-2018115043-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | MERCK PATENT GMBH (DE) | 2018-06-28 | — | — | WO | disclosed |
| WO-2018099835-A1 | CARBON-COMPRISING UNDERLAYER-FORMING COMPOSITION AND METHODS FOR MANUFACTURING CARBON-COMPRISING UNDERLAYER AND DEVICE USING THE SAME | AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. (LU) | 2018-06-07 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11366389-B2 | Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same | ALKBH1, ALKBH2, OR10J3 | SHBG 3883/4885KDM4E 787/4885CASP6 4658/4885 |
| US-20210181636-A1 | ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING THE SAME, AND METHOD OF MANUFACTURING RESIST UNDERLAYER AND SEMICONDUCTOR DEVICE USING THE SAME | ALKBH1, ALKBH2, OR10J3 | SHBG 3883/4885KDM4E 787/4885CASP6 4658/4885 |
| US-20200044158-A1 | NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURING COATING AND SEMICONDUCTOR USING THE SAME | TYR, TRPA1, CD99 | SHBG 3765/4885KDM4E 315/4885CASP6 2444/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.