Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MMP1 | P03956 | 3/20 | 0.43 |
| ▸ | MMP9 | P14780 | 2/20 | 0.43 |
| ▸ | MMP13 | P45452 | 2/20 | 0.43 |
| ▸ | CNR2 | P34972 | 1/20 | 0.42 |
| ▸ | MMP2 | P08253 | 2/20 | 0.41 |
| ▸ | MMP3 | P08254 | 1/20 | 0.41 |
| ▸ | PDE4A | P27815 | 1/20 | 0.41 |
| ▸ | PDE4B | Q07343 | 1/20 | 0.41 |
| ▸ | PDE4C | Q08493 | 1/20 | 0.41 |
| ▸ | PDE4D | Q08499 | 1/20 | 0.41 |
| ▸ | PPARG | P37231 | 1/20 | 0.41 |
| ▸ | PPARA | Q07869 | 1/20 | 0.41 |
| ▸ | ACE | P12821 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA2 | P00918 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | MTNR1A | P48039 | 2/20 | 0.39 |
| ▸ | MTNR1B | P49286 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9728458 | 0.95 | CNR2 (0.46) | CNR2PPARGPPARAACEMEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL20421989 | 0.92 | CTRB1 (0.42) | MMP1MMP9MMP13CNR2MMP2 | |
| SCHEMBL9220919 | 0.86 | PPARG (0.44) | PPARGPPARA | |
| SCHEMBL9222910 | 0.83 | MMP8 (0.44) | CNR2PPARGPPARAACEKMT2A | |
| SCHEMBL9728278 | 0.82 | GAA (0.50) | PDE4APPARGPPARAACEKMT2A | |
| SCHEMBL20291444 | 0.80 | ACE (0.43) | ACE | |
| SCHEMBL20421985 | 0.77 | HTT (0.48) | MMP1MMP2MMP3PDE4APDE4B | |
| SCHEMBL9474766 | 0.77 | ALDH1A1 (0.58) | MMP1MMP13CNR2PPARGPPARA | |
| Hydrochloric Acid SCHEMBL9238933 | 0.75 | ALDH1A1 (0.56) | MMP1MMP13CNR2PPARGPPARA | |
| SCHEMBL28394769 | 0.74 | POLB (0.42) | PPARGPPARAACEKMT2AMTNR1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10780679-B2 | Laminate, method for manufacturing laminate, semiconductor device, and method for manufacturing the semiconductor device | FUJIFILM CORPORATION (JP) | 2020-09-22 | — | — | US | disclosed |
| EP-3339352-B1 | RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-09-16 | — | — | EP | disclosed |
| US-10450417-B2 | Resin, composition, cured film, method for manufacturing cured film and semiconductor device | FUJIFILM CORPORATION (JP) | 2019-10-22 | — | — | US | disclosed |
| EP-3339023-B1 | LAMINATE, METHOD FOR MANUFACTURING THE LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2019-07-03 | — | — | EP | disclosed |
| US-20180222164-A1 | LAMINATE, METHOD FOR MANUFACTURING LAMINATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2018-08-09 | — | — | US | disclosed |
| US-20180215874-A1 | RESIN, COMPOSITION, CURED FILM, METHOD FOR MANUFACTURING CURED FILM AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2018-08-02 | — | — | US | disclosed |