Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR2A | P28223 | 3/20 | 0.32 |
| ▸ | HRH1 | P35367 | 3/20 | 0.32 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.32 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | TTR | P02766 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | RIPK1 | Q13546 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2101441 | 0.86 | HTR2A (0.37) | HTR2AHRH1AOC3KDM4EALDH1A1 | |
| SCHEMBL2101734 | 0.80 | MEN1 (0.33) | HTR2AHRH1AOC3KCNN4MEN1 | |
| SCHEMBL2103612 | 0.79 | ADRA2B (0.40) | HTR2AHRH1AOC3KDM4EALDH1A1 | |
| SCHEMBL2103073 | 0.74 | TSHR (0.33) | RIPK1 | |
| SCHEMBL2102164 | 0.73 | SIGMAR1 (0.35) | HTR2AHRH1AOC3KCNN4MEN1 | |
| SCHEMBL2101130 | 0.71 | HTR2A (0.32) | HTR2AHRH1KCNN4MEN1KMT2A | |
| SCHEMBL1254751 | 0.69 | MAPK1 (0.36) | KCNN4ALDH1A1KMT2A | |
| SCHEMBL2102750 | 0.68 | PGR (0.34) | HTR2AHRH1KDM4EALDH1A1RIPK1 | |
| SCHEMBL2102686 | 0.68 | HSP90AA1 (0.32) | HTR2AHRH1KCNN4 | |
| Ethane SCHEMBL8430515 | 0.67 | MAPK1 (0.35) | ALDH1A1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |