SCHEMBL2102686

SCHEMBL2102686

CNC(Cl)C(C)(C)[SiH2]c1ccccc1

nearest known ligand 0.32

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
HSP90AA1 P07900 1/20 0.32
MAPT P10636 1/20 0.32
GPR55 Q9Y2T6 1/20 0.32
TAAR1 Q96RJ0 2/20 0.31
SLC18A2 Q05940 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
LMNA P02545 1/20 0.31
CYP2D6 P10635 1/20 0.31
HTR2A P28223 1/20 0.31
HRH1 P35367 1/20 0.31
KCNN4 O15554 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2100788 0.80 SIGMAR1 (0.37) MAPTSIGMAR1LMNAKCNN4
SCHEMBL2101130 0.80 HTR2A (0.32) TAAR1SLC18A2SIGMAR1LMNACYP2D6
SCHEMBL2103073 0.79 TSHR (0.33) HSP90AA1MAPTGPR55
SCHEMBL2101734 0.73 MEN1 (0.33) HTR2AHRH1KCNN4
SCHEMBL2102750 0.69 PGR (0.34) SIGMAR1HTR2AHRH1
SCHEMBL2102109 0.68 HTR2A (0.32) HTR2AHRH1KCNN4
SCHEMBL2103176 0.68 SIGMAR1 (0.39) GPR55SIGMAR1LMNACYP2D6HRH1
SCHEMBL10318392 0.67 TSHR (0.33) HSP90AA1MAPTGPR55TAAR1LMNA
SCHEMBL2102290 0.67 TAAR1 (0.34) TAAR1SLC18A2SIGMAR1CYP2D6HTR2A
SCHEMBL2272708 0.67 TAAR1 (0.32) MAPTTAAR1LMNACYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed