SCHEMBL2102166

SCHEMBL2102166

CCN[Si](c1ccccc1)(N(C)C)C(C)(C)C

nearest known ligand 0.34

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
KCNN4 O15554 1/20 0.34
TAAR1 Q96RJ0 1/20 0.31
RIPK1 Q13546 1/20 0.30
AOC3 Q16853 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2270811 0.75 KCNN4 (0.38) KCNN4TAAR1AOC3
SCHEMBL2103963 0.73 KCNN4 (0.32) KCNN4
SCHEMBL2103177 0.72 KCNN4 (0.39) KCNN4TAAR1RIPK1
SCHEMBL2269404 0.72 KCNN4 (0.39) KCNN4TAAR1RIPK1
SCHEMBL2101901 0.72 KCNN4 (0.34) KCNN4TAAR1AOC3
SCHEMBL2103088 0.72 KCNN4 (0.34) KCNN4TAAR1AOC3
SCHEMBL2101654 0.72 KCNN4 (0.34) KCNN4TAAR1AOC3
SCHEMBL2100450 0.70 ALDH1A1 (0.32) KCNN4
SCHEMBL2103257 0.69 KCNN4 (0.32) KCNN4
SCHEMBL2100791 0.69 KCNN4 (0.36) KCNN4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed