SCHEMBL210491

SCHEMBL210491

Cc1ccc(O)c(Cc2cc(C)c(O)c(CO)c2C)c1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AMY1A P0DUB6 1/20 0.58
HTT P42858 2/20 0.39
TP53 P04637 2/20 0.39
TDP1 Q9NUW8 1/20 0.39
SHBG P04278 1/20 0.37
TRPA1 O75762 1/20 0.36
ALOX15 P16050 4/20 0.36
HIF1A Q16665 3/20 0.36
LMNA P02545 3/20 0.36
MAPT P10636 3/20 0.36
HPGD P15428 3/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
HSPA5 P11021 2/20 0.36
MEN1 O00255 2/20 0.36
ALOX12 P18054 2/20 0.36
KMT2A Q03164 2/20 0.36
SLC22A1 O15245 1/20 0.36
USP2 O75604 1/20 0.36
HSP90AA1 P07900 1/20 0.36
CYP3A4 P08684 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278560 0.91 AMY1A (0.62) AMY1AHTTTP53TDP1TRPA1
SCHEMBL8495178 0.91 AMY1A (0.62) AMY1AHTTTP53TDP1TRPA1
SCHEMBL8588031 0.91 AMY1A (0.62) AMY1AHTTTP53TDP1TRPA1
SCHEMBL8346927 0.91 AMY1A (0.62) AMY1AHTTTP53TDP1TRPA1
SCHEMBL30002986 0.91 AMY1A (0.62) AMY1AHTTTP53TDP1TRPA1
SCHEMBL1661235 0.87 AMY1A (0.71) AMY1AHTTTP53TDP1TRPA1
SCHEMBL30374732 0.85 AMY1A (0.59) AMY1AHTTTP53TDP1TRPA1
SCHEMBL278214 0.85 AMY1A (0.59) AMY1AHTTTP53TDP1TRPA1
SCHEMBL212514 0.85 SHBG (0.47) AMY1ATP53SHBGALOX15HIF1A
SCHEMBL23174716 0.84 AMY1A (0.66) AMY1AHTTTP53TDP1TRPA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN claimed
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN disclosed
US-RE43067-E1 Method for producing new polynuclear poly(formylphenol) HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2012-01-03 US disclosed
US-7750190-B2 reacting hexamethylene tetramine in presence of acid; industrial scale; photoresists HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2010-07-06 US disclosed
US-20090182175-A1 METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2009-07-16 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090182175-A1 METHOD FOR PRODUCING NEW POLYNUCLEAR POLY(FORMYLPHENOL) PCBP1, FPR2, PNKP AMY1A 2459/4885HTT 919/4885TP53 3121/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.