SCHEMBL21160441

SCHEMBL21160441

CC(C)(c1ccc(Oc2ccc(N3COc4c(ccc5ccccc45)C3)cc2)cc1)c1ccc(Oc2ccc(N3COc4c(ccc5ccccc45)C3)cc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
VDR P11473 1/20 0.35
MAPT P10636 4/20 0.33
ALDH1A1 P00352 2/20 0.33
NPC1 O15118 1/20 0.33
TP53 P04637 1/20 0.33
RAB9A P51151 1/20 0.33
BACE1 P56817 1/20 0.33
SMN1; SMN2 Q16637 1/20 0.33
KDM4E B2RXH2 1/20 0.32
CYP1A2 P05177 1/20 0.31
LTA4H P09960 1/20 0.31
KMT2A Q03164 2/20 0.30
MEN1 O00255 1/20 0.30
NFKB1 P19838 1/20 0.30
NFKB2 Q00653 1/20 0.30
RELA Q04206 1/20 0.30
USP2 O75604 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21160440 0.91 VDR (0.38) VDRMAPTALDH1A1NPC1TP53
SCHEMBL12913709 0.83 VDR (0.43) VDRMAPTALDH1A1NPC1RAB9A
SCHEMBL12913705 0.79 VDR (0.45) VDRMAPTALDH1A1NPC1RAB9A
SCHEMBL13203365 0.79 RAB9A (0.40) VDRMAPTALDH1A1NPC1TP53
SCHEMBL15892650 0.77 CYP1A2 (0.38) VDRMAPTALDH1A1NPC1TP53
SCHEMBL12913695 0.77 GAA (0.49) VDRMAPTALDH1A1KDM4ECYP1A2
SCHEMBL21160442 0.74 PKM (0.43) VDRMAPTALDH1A1KDM4ECYP1A2
SCHEMBL21160631 0.73 HTR1A (0.41) VDRMAPTALDH1A1KDM4ECYP1A2
SCHEMBL21160443 0.71 KDM4E (0.36) VDRMAPTSMN1; SMN2KDM4ECYP1A2
SCHEMBL15202635 0.70 GAA (0.39) MAPTALDH1A1NPC1TP53RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate JSR CORPORATION (JP) 2022-01-04 US disclosed
US-20190212650-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR FORMING THE SAME, AND PRODUCTION METHOD OF A PATTERNED SUBSTRATE JSR CORPORATION (JP) 2019-07-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate TOP1, OXA1L, RER1 VDR 4451/4885MAPT 3830/4885ALDH1A1 826/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.