SCHEMBL21160442

SCHEMBL21160442

O=S(=O)(c1ccc(N2COc3c(ccc4ccccc34)C2)cc1)c1ccc(N2COc3c(ccc4ccccc34)C2)cc1

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.43
TSHR P16473 1/20 0.43
HTR6 P50406 5/20 0.41
VDR P11473 1/20 0.37
CYP1A2 P05177 1/20 0.35
MAPT P10636 2/20 0.34
MEN1 O00255 1/20 0.34
ALDH1A1 P00352 1/20 0.34
KMT2A Q03164 1/20 0.34
KDM4E B2RXH2 1/20 0.33
HTR2C P28335 1/20 0.32
CHRM2 P08172 1/20 0.32
CHRM1 P11229 1/20 0.32
CYP1A1 P04798 1/20 0.32
CYP1B1 Q16678 1/20 0.32
PIK3CA P42336 1/20 0.31
CASR P41180 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12913709 0.89 VDR (0.43) TSHRVDRCYP1A2MAPTMEN1
SCHEMBL12913705 0.85 VDR (0.45) TSHRVDRCYP1A2MAPTMEN1
SCHEMBL12913695 0.83 GAA (0.49) VDRCYP1A2MAPTMEN1ALDH1A1
SCHEMBL21160440 0.82 VDR (0.38) VDRCYP1A2MAPTMEN1ALDH1A1
SCHEMBL21160443 0.77 KDM4E (0.36) VDRCYP1A2MAPTMEN1KMT2A
SCHEMBL21160631 0.75 HTR1A (0.41) TSHRHTR6VDRCYP1A2MAPT
SCHEMBL13203361 0.75 PKM (0.49) PKMTSHRHTR6MEN1KMT2A
SCHEMBL12913698 0.74 MEN1 (0.52) VDRCYP1A2MEN1KMT2ACYP1A1
SCHEMBL21160441 0.74 VDR (0.35) VDRCYP1A2MAPTMEN1ALDH1A1
SCHEMBL12913706 0.73 CYP1A2 (0.55) VDRCYP1A2MAPTMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate JSR CORPORATION (JP) 2022-01-04 US disclosed
US-20190212650-A1 COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, RESIST UNDERLAYER FILM AND METHOD FOR FORMING THE SAME, AND PRODUCTION METHOD OF A PATTERNED SUBSTRATE JSR CORPORATION (JP) 2019-07-11 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11215928-B2 Composition for resist underlayer film formation, resist underlayer film and method for forming the same, and production method of a patterned substrate TOP1, OXA1L, RER1 PKM 4013/4885TSHR 3311/4885HTR6 562/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.