SCHEMBL21170004

SCHEMBL21170004

C=CC(=O)Oc1ccc(O)c(O)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 3/20 0.47
APP P05067 2/20 0.41
TTR P02766 2/20 0.40
KDM4E B2RXH2 3/20 0.38
ALOX12 P18054 2/20 0.38
POLB P06746 2/20 0.38
MAPT P10636 2/20 0.38
RAB9A P51151 2/20 0.38
L3MBTL1 Q9Y468 2/20 0.38
MMP9 P14780 2/20 0.38
RGS12 O14924 1/20 0.38
TP53 P04637 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
PKM P14618 1/20 0.38
ALOX15 P16050 1/20 0.38
CASP1 P29466 1/20 0.38
THPO P40225 1/20 0.38
GNAI1 P63096 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11225929 0.88 THRB (0.47) THRBKDM4EALOX12MAPTRAB9A
SCHEMBL28476797 0.83 THRB (0.44) THRBKDM4EMAPTRAB9ACYP3A4
SCHEMBL28475721 0.83 THRB (0.44) THRBMAPTRAB9AL3MBTL1CYP3A4
SCHEMBL31169459 0.83 NPC1 (0.58) THRBAPPMAPTRAB9AL3MBTL1
SCHEMBL8512513 0.83 NPC1 (0.58) THRBAPPMAPTRAB9AL3MBTL1
SCHEMBL10694878 0.83 THRB (0.47) THRBKDM4EMAPTRAB9AL3MBTL1
SCHEMBL819722 0.83 THRB (0.53) THRBKDM4EALOX12MAPTRAB9A
SCHEMBL68673 0.82 KMT2A (0.50) THRBMAPTRAB9ACYP1A2CYP3A4
SCHEMBL23611218 0.82 TYR (0.59) THRBPOLBMAPTCYP1A2ALDH1A1
SCHEMBL9138399 0.82 ALDH1A1 (0.53) THRBKDM4EPOLBMAPTRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117430802-B Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-05-10 CN claimed
CN-117801175-A Low-sensitivity ester polycarboxylate water reducer and preparation method and application thereof 科之杰新材料集团有限公司 2024-04-02 CN claimed
CN-117777375-A Ether polycarboxylate water reducer and preparation method and application thereof 科之杰新材料集团有限公司 2024-03-29 CN claimed
CN-117430802-A Preparation method of polyhydroxy acrylic ester macromer, method for preparing polymer polyol by using polyhydroxy acrylic ester macromer and application of polyhydroxy acrylic ester macromer 山东一诺威新材料有限公司 2024-01-23 CN claimed
CN-108192020-B Preparation method of intelligent zwitterionic polymer material 兰州石化职业技术学院 2020-05-08 CN claimed
CN-102838570-A Mailuoning ester and preparation method and function thereof JINLING PHARMACEUTICAL CO LTD 2012-12-26 CN claimed
CN-118286135-A Skin repair composition and application thereof in cosmetics 上海枫萃生物科技有限公司 2024-07-05 CN disclosed
CN-116217891-B Intrinsic antibacterial epoxy resin precursor, composition, preparation method and application thereof 中国科学院宁波材料技术与工程研究所 2024-01-23 CN disclosed
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
US-11640113-B2 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device FUJIFILM CORPORATION (JP) 2023-05-02 US disclosed
CN-115867648-A Extension of chemical substrates for genetic code reprogramming to include long chain carbons and cyclic amino acids 西北大学 2023-03-28 CN disclosed
CN-109651253-B Phenylpropanoid ester derivative and application thereof as neuroprotective medicament 上海医药工业研究院 2022-03-25 CN disclosed
EP-3521926-B1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM CORP (JP) 2021-04-21 EP disclosed
CN-108192020-B Preparation method of intelligent zwitterionic polymer material 兰州石化职业技术学院 2020-05-08 CN disclosed
EP-3521926-A1 ACTIVE LIGHT SENSITIVE OR RADIATION SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD AND METHOD FOR PRODUCING ELECTRONIC DEVICE FUJIFILM Corporation (JP) 2019-08-07 EP disclosed
US-20190219921-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, AND METHOD OF MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2019-07-18 US disclosed
CN-105503940-A Preparation technology of germanium caffeate LIU ZHENYU 2016-04-20 CN disclosed
CN-102838570-B Mailuoning ester and preparation method and function thereof JINLING PHARMACEUTICAL CO LTD 2014-07-16 CN disclosed