SCHEMBL21189646

SCHEMBL21189646

O=C(O)c1ccc(C(c2ccccc2)(c2ccc(S)c(-c3ccccc3)c2)c2ccc(S)c(-c3ccccc3)c2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RXRA P19793 4/20 0.47
RXRB P28702 4/20 0.47
EGFR P00533 1/20 0.41
CYP2C8 P10632 1/20 0.40
SRD5A2 P31213 4/20 0.40
KMO O15229 1/20 0.40
MAP4K4 O95819 2/20 0.40
RXRG P48443 2/20 0.40
ALDH1A1 P00352 2/20 0.39
SRD5A1 P18405 1/20 0.39
TTR P02766 1/20 0.38
CA12 O43570 1/20 0.38
CA1 P00915 1/20 0.38
CA9 Q16790 1/20 0.38
PTGDR2 Q9Y5Y4 1/20 0.38
KDM4E B2RXH2 1/20 0.38
NPC1 O15118 1/20 0.38
GAA P10253 1/20 0.38
HPGD P15428 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22737555 0.88 TTR (0.45) RXRARXRBCYP2C8SRD5A2SRD5A1
SCHEMBL21189643 0.87 KIF11 (0.38) ALDH1A1PTGDR2NPC1HPGDRAB9A
SCHEMBL23861382 0.84 RXRA (0.48) RXRARXRBEGFRCYP2C8SRD5A2
SCHEMBL20721895 0.79 TSHR (0.59) RXRARXRBSRD5A2RXRGCA12
SCHEMBL18896444 0.79 TSHR (0.59) RXRARXRBSRD5A2RXRGCA12
SCHEMBL21189499 0.78 KIF11 (0.36) ALDH1A1CA1CA9PTGDR2NPC1
SCHEMBL23861383 0.75 RXRA (0.41) RXRARXRBEGFRCYP2C8SRD5A2
SCHEMBL31738420 0.74 ALDH1A1 (0.47) RXRARXRBALDH1A1PTGDR2NPC1
SCHEMBL22991295 0.74 ALDH1A1 (0.47) RXRARXRBALDH1A1PTGDR2NPC1
SCHEMBL21189639 0.74 ALDH1A1 (0.39) ALDH1A1PTGDR2NPC1RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3744710-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2020-12-02 EP disclosed
WO-2019142897-A1 COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD 三菱瓦斯化学株式会社 2019-07-25 WO disclosed