Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 4/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.53 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.53 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 2/20 | 0.53 |
| ▸ | GMNN | O75496 | 1/20 | 0.53 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.53 |
| ▸ | CNR1 | P21554 | 1/20 | 0.53 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.53 |
| ▸ | CNR2 | P34972 | 1/20 | 0.53 |
| ▸ | THPO | P40225 | 1/20 | 0.53 |
| ▸ | MTOR | P42345 | 1/20 | 0.53 |
| ▸ | BLM | P54132 | 1/20 | 0.53 |
| ▸ | PMP22 | Q01453 | 1/20 | 0.53 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.53 |
| ▸ | CES2 | O00748 | 1/20 | 0.52 |
| ▸ | CES1 | P23141 | 1/20 | 0.52 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9002807 | 0.88 | CYP2A6 (0.50) | HPGDCYP3A4ALOX15MAPK1CYP1A2 | |
| SCHEMBL29626829 | 0.86 | TSHR (0.54) | HPGDCYP1A2TSHRCYP2C19ALDH1A1 | |
| SCHEMBL230034 | 0.86 | TSHR (0.54) | HPGDCYP1A2TSHRCYP2C19ALDH1A1 | |
| SCHEMBL8556933 | 0.84 | L3MBTL1 (0.53) | HPGDCYP1A2TSHRCYP2C19CNR2 | |
| SCHEMBL29000268 | 0.82 | NPC1 (0.46) | HPGDCYP3A4ALOX15MAPK1CYP1A2 | |
| SCHEMBL26016720 | 0.81 | SMN1; SMN2 (0.59) | HPGDCYP3A4ALOX15MAPK1LMNA | |
| SCHEMBL9624773 | 0.79 | ALDH1A1 (0.68) | HPGDCYP3A4ALOX15MAPK1CYP1A2 | |
| Sulfuric Acid SCHEMBL10833755 | 0.79 | L3MBTL1 (0.48) | HPGDCYP3A4CYP1A2TSHRCYP2C19 | |
| SCHEMBL6238903 | 0.78 | BCL2L1 (0.55) | HPGDMAPK1CYP1A2TSHRCNR1 | |
| SCHEMBL17427553 | 0.78 | ABCG2 (0.53) | HPGDCYP1A2TSHRCYP2C19ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-9031757-A | — | — | None | — | — | JP | disclosed |
| US-20230037858-A1 | COMPOSITION CONTAINING ADDITION CONDENSATION PRODUCT, METHOD FOR PRODUCING SAME, USE OF SAME, POLYMERIZATION VESSEL, AND METHOD FOR PRODUCING POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-02-09 | — | — | US | disclosed |
| US-11345651-B2 | Addition condensation product, production method and use of same, polymerization vessel, and production method of polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-05-31 | — | — | US | disclosed |
| US-20210403611-A1 | PRODUCTION METHOD OF ADDITION CONDENSATION PRODUCT | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| US-20210403405-A1 | ADDITION CONDENSATION PRODUCT, PRODUCTION METHOD AND USE OF SAME, POLYMERIZATION VESSEL, AND PRODUCTION METHOD OF POLYMER | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2021-12-30 | — | — | US | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-6096144-A | TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-08-01 | — | — | US | disclosed |
| US-6037426-A | POLYMERIZING MONOMER HAVING ETHYLENIC DOUBLE BOND IN POLYMERIZATION VESSEL HAVING BILAYER POLYMER SCALE PREVENTIVE COATING FILM ON INNER WALL SURFACES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-14 | — | — | US | disclosed |
| EP-0934955-A1 | Polymerization process characterized by a two layer coating against scale formation deposited using a steam carrier | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-11 | — | — | EP | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0872903-A1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | Shin-Etsu Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |
| JP-H0931757-A | MANUFACTURING OF GRAPHITE FIBER | RES DEV CORP OF JAPAN | 1997-02-04 | — | — | JP | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | HPGD 4505/4885CYP3A4 2748/4885ALOX15 850/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | HPGD 3630/4885CYP3A4 3044/4885ALOX15 2857/4885 |
| US-11345651-B2 | Addition condensation product, production method and use of same, polymerization vessel, and production method of polymer | MCCC2, PYCARD, PCCA | HPGD 2149/4885CYP3A4 776/4885ALOX15 1792/4885 |
| US-20210403405-A1 | ADDITION CONDENSATION PRODUCT, PRODUCTION METHOD AND USE OF SAME, POLYMERIZATION VESSEL, AND PRODUCTION METHOD OF POLYMER | MCCC2, PYCARD, PCCA | HPGD 2149/4885CYP3A4 776/4885ALOX15 1792/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.