Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NCF1 | P14598 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.32 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.32 |
| ▸ | USP2 | O75604 | 1/20 | 0.32 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1969300 | 0.91 | — | — | |
| SCHEMBL28307215 | 0.88 | LMNA (0.33) | MEN1KMT2A | |
| SCHEMBL28351506 | 0.88 | CA2 (0.35) | KDM4ERAB9ASMN1; SMN2NPC1MEN1 | |
| SCHEMBL22472071 | 0.85 | LTA4H (0.39) | KDM4ESMN1; SMN2TSHR | |
| SCHEMBL1971501 | 0.82 | POLB (0.32) | KDM4ESMN1; SMN2 | |
| SCHEMBL30883010 | 0.82 | LTA4H (0.32) | NCF1KDM4ERAB9ASMN1; SMN2NPC1 | |
| SCHEMBL11444489 | 0.80 | NCF1 (0.40) | NCF1KDM4ERAB9ASMN1; SMN2NPC1 | |
| SCHEMBL1225533 | 0.80 | TSHR (0.33) | KDM4ERAB9ASMN1; SMN2NPC1TP53 | |
| SCHEMBL1967786 | 0.77 | NCF1 (0.38) | NCF1KDM4ERAB9ASMN1; SMN2NPC1 | |
| SCHEMBL669703 | 0.77 | LMNA (0.36) | KDM4ESMN1; SMN2TP53MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111902774-B | Composition for forming silicon-containing resist underlayer film comprising nitric acid and protected phenol group | 日产化学株式会社 | 2023-10-31 | — | — | CN | disclosed |
| US-20230112897-A1 | COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2023-04-13 | — | — | US | disclosed |
| CN-111742020-B | Composition for forming photocurable silicon-containing coating film | 日产化学株式会社 | 2022-08-16 | — | — | CN | disclosed |
| US-20210054231-A1 | COMPOSITION FOR FORMING PHOTOCURABLE SILICON-CONTAINING COATING FILM | NISSAN CHEMICAL CORPORATION (JP) | 2021-02-25 | — | — | US | disclosed |
| US-20210018840-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION WHICH CONTAINS PROTECTED PHENOLIC GROUP AND NITRIC ACID | NISSAN CHEMICAL CORPORATION (JP) | 2021-01-21 | — | — | US | disclosed |
| CN-111902774-A | Composition for forming silicon-containing resist underlayer film containing nitric acid and protected phenol group | 日产化学株式会社 | 2020-11-06 | — | — | CN | disclosed |
| CN-111742020-A | Composition for forming photocurable silicon-containing coating film | 日产化学株式会社 | 2020-10-02 | — | — | CN | disclosed |
| US-20190265593-A1 | SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING ORGANIC GROUP HAVING DIHYDROXY GROUP | NISSAN CHEMICAL CORPORATION (JP) | 2019-08-29 | — | — | US | disclosed |