SCHEMBL2167176

SCHEMBL2167176

COC(C(=O)O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.35
ALDH1A1 P00352 2/20 0.32
TSHR P16473 1/20 0.32
L3MBTL1 Q9Y468 1/20 0.31
NOTUM Q6P988 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2463205 0.76 MEN1 (0.42) ALDH1A1TSHR
SCHEMBL14670264 0.74 GAA (0.34) THRBALDH1A1TSHR
SCHEMBL14670245 0.74
SCHEMBL569197 0.72 TSHR (0.35) THRBALDH1A1TSHRL3MBTL1
SCHEMBL9348121 0.72 LMNA (0.32) THRBALDH1A1TSHR
SCHEMBL12470841 0.71 ALDH1A1 (0.35) THRBALDH1A1TSHRL3MBTL1
SCHEMBL11326905 0.71
SCHEMBL14670246 0.70 ALDH1A1 (0.32) THRBALDH1A1TSHR
SCHEMBL17094651 0.70 ALDH1A1 (0.36) THRBALDH1A1TSHR
SCHEMBL15087844 0.70 ALDH1A1 (0.36) THRBALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2025663-B1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME DAIKIN IND LTD (JP) 2013-02-20 EP claimed
US-7985877-B2 Carboxylic acid compound, use thereof, and process for producing the same DAIKIN INDUSTRIES, LTD. (JP) 2011-07-26 US claimed
US-20090156861-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME DAIKIN INDUSTRIES, LTD. (JP) 2009-06-18 US claimed
EP-2025663-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME Daikin Industries, Ltd. (JP) 2009-02-18 EP claimed
US-20240027902-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-01-25 US disclosed
US-20230359119-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-11-09 US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 US disclosed
US-20230305394-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230305393-A1 RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-28 US disclosed
US-20230161252-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-11415887-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-08-16 US disclosed
US-20220066319-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-03-03 US disclosed
US-20090156861-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME DAIKIN INDUSTRIES, LTD. (JP) 2009-06-18 US disclosed
US-20090156861-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME DAIKIN INDUSTRIES, LTD. (JP) 2009-06-18 US disclosed
CN-101460444-A Novel carboxylic acid compound, use thereof, and method for producing same DAIKIN IND LTD (JP) 2009-06-17 CN disclosed
EP-2025663-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME Daikin Industries, Ltd. (JP) 2009-02-18 EP disclosed
EP-2025663-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME Daikin Industries, Ltd. (JP) 2009-02-18 EP disclosed
EP-2025663-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME Daikin Industries, Ltd. (JP) 2009-02-18 EP disclosed
JP-2008013540-A NEW CARBOXYLIC ACID COMPOUND, APPLICATION OF THE SAME, AND METHOD FOR PRODUCING THE SAME DAIKIN IND LTD 2008-01-24 JP disclosed
WO-2007142110-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME DAIKIN INDUSTRIES, LTD. (JP) 2007-12-13 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090156861-A1 NOVEL CARBOXYLIC ACID COMPOUND, USE THEREOF, AND PROCESS FOR PRODUCING THE SAME HAO2, FTO, HCAR2 THRB 4228/4885ALDH1A1 268/4885TSHR 4336/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.