SCHEMBL217397

SCHEMBL217397

C=C(C)C(=O)Nc1ccccc1N=Nc1ccc(C(=O)OCC)c(O)c1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA12 O43570 1/20 0.43
▸ CA1 P00915 1/20 0.43
▸ CA2 P00918 1/20 0.43
▸ CA7 P43166 1/20 0.43
▸ CA9 Q16790 1/20 0.43
▸ CA14 Q9ULX7 1/20 0.43
▸ KDM4E B2RXH2 5/20 0.43
▸ ALDH1A1 P00352 2/20 0.43
▸ CYP1A2 P05177 2/20 0.43
▸ CYP2C19 P33261 2/20 0.43
▸ JAK3 P52333 8/20 0.42
▸ RAB9A P51151 2/20 0.40
▸ TSHR P16473 2/20 0.40
▸ MEN1 O00255 1/20 0.40
▸ USP2 O75604 1/20 0.40
▸ POLB P06746 1/20 0.40
▸ MAPT P10636 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ LMNA P02545 1/20 0.40
▸ HSD17B10 Q99714 4/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4651757 1.00 CA12 (0.43) CA12CA1CA2CA7CA9
SCHEMBL4651722 0.85 KMT2A (0.46) KDM4EALDH1A1CYP1A2CYP2C19MEN1
SCHEMBL219154 0.85 KMT2A (0.46) KDM4EALDH1A1CYP1A2CYP2C19MEN1
SCHEMBL217821 0.77 ATIC (0.39) CA2ALDH1A1CYP1A2MEN1MAPT
SCHEMBL8384070 0.76 KDM4E (0.67) KDM4EALDH1A1CYP1A2CYP2C19TSHR
SCHEMBL218264 0.76 MEN1 (0.41) CA12CA1CA9ALDH1A1CYP1A2
SCHEMBL9450739 0.76 NPC1 (0.48) KDM4EALDH1A1RAB9APOLBMAPT
SCHEMBL14690094 0.76 NPC1 (0.48) KDM4EALDH1A1RAB9APOLBMAPT
SCHEMBL4000024 0.75 CHRM1 (0.50) KDM4EALDH1A1RAB9AMEN1MAPT
SCHEMBL14690050 0.74 MAPT (0.51) KDM4EALDH1A1RAB9AMEN1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 117 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1465877-B1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING AZ ELECTRONIC MATERIALS USA (US) 2008-09-24 — — EP claimed
EP-1845415-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2007-10-17 — — EP claimed
US-20060199103-A1 Process for producing an image using a first minimum bottom antireflective coating composition NEISSER MARK O 2006-09-07 — — US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 — — EP claimed
US-7070914-B2 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-04 — — US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 — — US claimed
EP-1466216-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2004-10-13 — — EP claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 — — EP claimed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO claimed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 — — US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 — — US claimed
US-12638775-B2 Methods and compositions for improved patterning of photoresist TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-05-26 — — US disclosed
US-20240371640-A1 UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2024-11-07 — — US disclosed
US-12074027-B2 Underlayer of multilayer structure and methods of use thereof TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2024-08-27 — — US disclosed
US-20230146910-A1 METHODS AND COMPOSITIONS FOR IMPROVED PATTERNING OF PHOTORESIST TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2023-05-11 — — US disclosed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO disclosed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO disclosed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 — — US disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12638775-B2 Methods and compositions for improved patterning of photoresist DSG1, SCO2, ERCC1 CA12 182/4885CA1 57/4885CA2 100/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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