SCHEMBL219154

SCHEMBL219154

C=C(C)C(=O)Nc1ccccc1N=Nc1ccc(C(=O)O)c(O)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 7/20 0.46
▸ MEN1 O00255 6/20 0.46
▸ MAPT P10636 5/20 0.46
▸ GAA P10253 2/20 0.46
▸ NPSR1 Q6W5P4 2/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ AR P10275 1/20 0.45
▸ IDE P14735 1/20 0.42
▸ MAPK1 P28482 2/20 0.42
▸ CYP1A2 P05177 1/20 0.42
▸ HPGD P15428 1/20 0.42
▸ CYP2C19 P33261 1/20 0.42
▸ HSD17B10 Q99714 1/20 0.42
▸ HTT P42858 2/20 0.40
▸ PDE4A P27815 1/20 0.40
▸ BLVRB P30043 1/20 0.40
▸ KDR P35968 1/20 0.40
▸ MYC P01106 1/20 0.39
▸ THRB P10828 2/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4651722 1.00 KMT2A (0.46) KMT2AMEN1MAPTGAANPSR1
SCHEMBL217397 0.85 CA12 (0.43) KMT2AMEN1MAPTMAPK1CYP1A2
SCHEMBL4651757 0.85 CA12 (0.43) KMT2AMEN1MAPTMAPK1CYP1A2
SCHEMBL4000024 0.82 CHRM1 (0.50) KMT2AMEN1MAPTL3MBTL1IDE
SCHEMBL217821 0.82 ATIC (0.39) KMT2AMEN1MAPTGAANPSR1
SCHEMBL218264 0.81 MEN1 (0.41) KMT2AMEN1MAPTNPSR1L3MBTL1
SCHEMBL14690094 0.81 NPC1 (0.48) MAPTGAAL3MBTL1HPGDHTT
SCHEMBL9450739 0.81 NPC1 (0.48) MAPTGAAL3MBTL1HPGDHTT
SCHEMBL14690050 0.79 MAPT (0.51) KMT2AMEN1MAPTL3MBTL1MAPK1
SCHEMBL13609820 0.74 AHR (0.58) KMT2AMEN1MAPTGAAMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1845415-B1 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA (US) 2014-04-30 — — EP claimed
EP-1845415-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2007-10-17 — — EP claimed
EP-1720066-A2 Process for producing an image using a first minimum bottom antireflective coating composition AZ Electronic Materials USA Corp. (US) 2006-11-08 — — EP claimed
US-20060199103-A1 Process for producing an image using a first minimum bottom antireflective coating composition NEISSER MARK O 2006-09-07 — — US claimed
EP-1466216-B1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ ELECTRONIC MATERIALS USA (US) 2006-07-26 — — EP claimed
US-7070914-B2 Process for producing an image using a first minimum bottom antireflective coating composition AZ ELECTRONIC MATERIALS USA CORP. (US) 2006-07-04 — — US claimed
US-6844131-B2 Positive-working photoimageable bottom antireflective coating CLARIANT FINANCE (BVI) LIMITED (VG) 2005-01-18 — — US claimed
EP-1466216-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION AZ Electronic Materials USA Corp. (US) 2004-10-13 — — EP claimed
EP-1465877-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING Clariant International Ltd. (CH) 2004-10-13 — — EP claimed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO claimed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO claimed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 — — US claimed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 — — US claimed
US-12638775-B2 Methods and compositions for improved patterning of photoresist TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2026-05-26 — — US disclosed
US-20240371640-A1 UNDERLAYER OF MULTILAYER STRUCTURE AND METHODS OF USE THEREOF TAIWAN SEMICONDUCTOR MFG CO LTD (TW) 2024-11-07 — — US disclosed
US-12074027-B2 Underlayer of multilayer structure and methods of use thereof TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) 2024-08-27 — — US disclosed
WO-2003058348-A1 PROCESS FOR PRODUCING AN IMAGE USING A FIRST MINIMUM BOTTOM ANTIREFLECTIVE COATING COMPOSITION CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO disclosed
WO-2003057678-A1 POSITIVE-WORKING PHOTOIMAGEABLE BOTTOM ANTIREFLECTIVE COATING CLARIANT INTERNATIONAL LTD (CH) 2003-07-17 — — WO disclosed
US-20030129547-A1 Process for producing an image using a first minimum bottom antireflective coating composition MERCK PATENT GMBH (DE) 2003-07-10 — — US disclosed
US-20030129531-A1 Positive-working photoimageable bottom antireflective coating MERCK PATENT GMBH (DE) 2003-07-10 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12638775-B2 Methods and compositions for improved patterning of photoresist DSG1, SCO2, ERCC1 KMT2A 3306/4885MEN1 4008/4885MAPT 1537/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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