SCHEMBL21755769

SCHEMBL21755769

Oc1c(I)cc(C2c3cc(O)c4ccccc4c3Oc3c2cc(O)c2ccccc32)cc1I

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.38
HTT P42858 2/20 0.38
MEN1 O00255 4/20 0.34
KMT2A Q03164 4/20 0.34
KDM4E B2RXH2 2/20 0.34
MAPT P10636 2/20 0.34
NSD2 O96028 1/20 0.34
POLB P06746 1/20 0.34
MCL1 Q07820 1/20 0.34
EYA3 Q99504 2/20 0.33
EP300 Q09472 1/20 0.33
CYP2C19 P33261 1/20 0.33
SIRT2 Q8IXJ6 1/20 0.33
SIRT1 Q96EB6 1/20 0.33
SIRT5 Q9NXA8 1/20 0.33
TRPM4 Q8TD43 1/20 0.33
GAA P10253 1/20 0.32
MYB P10242 1/20 0.32
THRB P10828 2/20 0.32
USP2 O75604 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21755772 0.87 MYB (0.33) LMNAHTTMAPTEYA3CYP2C19
SCHEMBL23900987 0.77 KDM1A (0.41) TRPM4MYBSLC6A2SLC6A3
SCHEMBL21755764 0.74 TRPM4 (0.38) LMNAMEN1KMT2AKDM4EMAPT
SCHEMBL21755816 0.71 SHBG (0.36) LMNAMEN1KMT2AKDM4EMAPT
SCHEMBL10524061 0.66 HTT (0.41) LMNAHTTMEN1KMT2AKDM4E
SCHEMBL23900988 0.66 CYP1A2 (0.40) MYB
SCHEMBL15998782 0.66 HSD17B1 (0.37) LMNAHTTMEN1KMT2AKDM4E
SCHEMBL18644308 0.63 MYB (0.36) LMNAHTTMEN1KMT2AGAA
SCHEMBL16521609 0.61 HTT (0.43) LMNAHTTMEN1KMT2AKDM4E
SCHEMBL23587376 0.60 MEN1 (0.46) LMNAHTTMEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3842491-A1 COMPOUND, COMPOSITION CONTAINING THE SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-06-30 EP disclosed
WO-2020040162-A1 COMPOUND, COMPOSITION CONTAINING SAME, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING INSULATING FILM 三菱瓦斯化学株式会社 2020-02-27 WO disclosed