SCHEMBL2190318

SCHEMBL2190318

C=C(C)C(=O)OC1c2ccccc2CCC1CC

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 4/20 0.41
MTNR1B P49286 4/20 0.41
PIN1 Q13526 3/20 0.40
SLC6A2 P23975 3/20 0.39
SLC6A4 P31645 3/20 0.39
CYP2D6 P10635 2/20 0.39
SLC6A3 Q01959 1/20 0.39
TAS1R3 Q7RTX0 1/20 0.37
TAS1R1 Q7RTX1 1/20 0.37
TAS1R2 Q8TE23 1/20 0.37
DRD2 P14416 1/20 0.36
PDE4A P27815 1/20 0.36
PDE4B Q07343 1/20 0.36
PDE4C Q08493 1/20 0.36
PDE4D Q08499 1/20 0.36
PDE10A Q9Y233 1/20 0.35
HTT P42858 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9610363 0.87 SLC6A2 (0.37) MTNR1AMTNR1BSLC6A2SLC6A4CYP2D6
SCHEMBL9610353 0.83 TAS1R3 (0.42) PIN1TAS1R3TAS1R1TAS1R2DRD2
SCHEMBL12416535 0.79 MTNR1A (0.40) MTNR1AMTNR1BPIN1SLC6A2SLC6A4
SCHEMBL9610351 0.79 PIN1 (0.39) PIN1TAS1R3TAS1R1TAS1R2PDE4A
SCHEMBL14825669 0.78 PIN1 (0.39) MTNR1AMTNR1BPIN1TAS1R3TAS1R1
SCHEMBL2188983 0.78 IDO1 (0.50) PIN1DRD2PDE4APDE4BPDE4C
SCHEMBL9610366 0.78 HTT (0.42) TAS1R3TAS1R1TAS1R2HTT
SCHEMBL9610357 0.78 PIN1 (0.38) PIN1CYP2D6TAS1R3TAS1R1TAS1R2
SCHEMBL9610380 0.77 OPRM1 (0.41) PIN1TAS1R3TAS1R1TAS1R2HTT
SCHEMBL9610481 0.76 ACP3 (0.42) PIN1CYP2D6TAS1R3TAS1R1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-8501384-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-08-06 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed
US-20110171580-A1 POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-07-14 US disclosed