SCHEMBL3454878

SCHEMBL3454878

O=S(=O)(OS(c1ccccc1)(c1ccccc1)c1ccccc1)C12CC3CC(CC(C3)C1)C2

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.40
NPC1 O15118 1/20 0.40
RAB9A P51151 1/20 0.40
SMN1; SMN2 Q16637 1/20 0.40
ENPP3 O14638 1/20 0.39
CA2 P00918 1/20 0.39
ENPP1 P22413 1/20 0.39
ENPP2 Q13822 1/20 0.39
CA9 Q16790 1/20 0.39
ALDH1A1 P00352 2/20 0.36
GAA P10253 2/20 0.36
LMNA P02545 1/20 0.36
CNR1 P21554 1/20 0.35
CNR2 P34972 1/20 0.35
FAAH O00519 1/20 0.35
DUSP3 P51452 1/20 0.34
PTPN5 P54829 1/20 0.34
PTPN11 Q06124 1/20 0.34
FPR1 P21462 1/20 0.34
KDM4E B2RXH2 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3240736 0.77 GAA (0.47) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL16594082 0.73 NPC1 (0.35) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL515602 0.71 P2RX7 (0.37) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL21923025 0.70 GBA1 (0.44) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL812701 0.69 LMNA (0.71) KMT2ANPC1RAB9ASMN1; SMN2CA2
SCHEMBL28527990 0.69 ENPP3 (0.50) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL1977435 0.69 KDM4E (0.52) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL3454498 0.68 ALDH1A1 (0.51) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL2570105 0.67 P2RX7 (0.36) KMT2ANPC1RAB9ASMN1; SMN2ENPP3
SCHEMBL26136335 0.66 HTR6 (0.45) SMN1; SMN2CA2CA9ALDH1A1DUSP3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8394570-B2 Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-03-12 US disclosed
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-06-10 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100143830-A1 SULFONIUM SALT, ACID GENERATOR, RESIST COMPOSITION, PHOTOMASK BLANK, AND PATTERNING PROCESS TYK2, VRK2, ARSA KMT2A 2407/4885NPC1 4884/4885RAB9A 1566/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.