SCHEMBL21923053

SCHEMBL21923053

Cc1ccc(C)c(S(=O)(=O)NS(=O)(=O)c2ccccc2)c1

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.54
FFAR4 Q5NUL3 1/20 0.51
APAF1 O14727 1/20 0.50
GAA P10253 2/20 0.49
MEN1 O00255 1/20 0.49
G6PD P11413 1/20 0.49
KMT2A Q03164 1/20 0.49
ALDH1A1 P00352 4/20 0.49
TSHR P16473 1/20 0.49
EDNRB P24530 2/20 0.48
EDNRA P25101 2/20 0.48
SMN1; SMN2 Q16637 2/20 0.47
LMNA P02545 1/20 0.47
HPGD P15428 1/20 0.47
METAP2 P50579 1/20 0.47
CYP2C19 P33261 1/20 0.46
HTT P42858 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12478325 0.82 FFAR4 (0.49) TDP1FFAR4GAAALDH1A1TSHR
SCHEMBL10766706 0.80 CA12 (0.66) TDP1FFAR4GAAMEN1KMT2A
SCHEMBL10631367 0.79 KMT2A (0.53) TDP1FFAR4GAAMEN1KMT2A
SCHEMBL29727498 0.79 EDNRB (0.56) TDP1GAAMEN1G6PDKMT2A
SCHEMBL21923052 0.79 EDNRB (0.56) TDP1GAAMEN1G6PDKMT2A
SCHEMBL30963734 0.79 ALDH1A1 (0.51) TDP1FFAR4APAF1GAAKMT2A
SCHEMBL30642945 0.79 KMT2A (0.62) FFAR4MEN1KMT2AALDH1A1EDNRB
SCHEMBL757794 0.79 ALDH1A1 (0.51) TDP1FFAR4APAF1GAAKMT2A
SCHEMBL2356682 0.78 CYTH2 (0.58) FFAR4GAAMEN1KMT2AALDH1A1
SCHEMBL11520351 0.77 LMNA (0.72) TDP1GAAMEN1G6PDKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3644122-B1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2020-12-30 EP disclosed
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-04-30 US disclosed
EP-3644122-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2020-04-29 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200133121-A1 ONIUM SALT, NEGATIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING PROCESS SLC6A5, SLC11A2, LARP7 TDP1 4051/4885FFAR4 3517/4885APAF1 4436/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.