Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 1/20 | 0.55 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.55 |
| ▸ | GABRA1 | P14867 | 6/20 | 0.50 |
| ▸ | GABRB2 | P47870 | 6/20 | 0.50 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.44 |
| ▸ | MEN1 | O00255 | 5/20 | 0.44 |
| ▸ | MAPT | P10636 | 5/20 | 0.44 |
| ▸ | POLB | P06746 | 4/20 | 0.44 |
| ▸ | GAA | P10253 | 3/20 | 0.44 |
| ▸ | CNR1 | P21554 | 2/20 | 0.44 |
| ▸ | CNR2 | P34972 | 2/20 | 0.44 |
| ▸ | ALOX5 | P09917 | 1/20 | 0.44 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.44 |
| ▸ | RXRA | P19793 | 1/20 | 0.44 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.44 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.44 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.44 |
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.44 |
| ▸ | SIRT3 | Q9NTG7 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30853252 | 1.00 | ESR1 (0.55) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL30306994 | 1.00 | ESR1 (0.55) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL15814887 | 0.95 | ESR1 (0.50) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL15814218 | 0.95 | ESR1 (0.50) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL18541606 | 0.93 | ESR1 (0.52) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL5584479 | 0.92 | ESR1 (0.70) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL19316051 | 0.91 | GABRA1 (0.47) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL12018230 | 0.89 | ESR1 (0.45) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL15814541 | 0.88 | ESR1 (0.44) | ESR1ESR2GABRA1GABRB2AKR1B1 | |
| SCHEMBL18294457 | 0.87 | ESR1 (0.46) | ESR1ESR2GABRA1GABRB2AKR1B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 552 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2010043711-A1 | ALLOSTERIC PROTEIN KINASE MODULATORS | UNIVERSITAET DES SAARLANDES (DE) | 2010-04-22 | — | — | WO | claimed |
| US-7303855-B2 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-12-04 | — | — | US | claimed |
| US-20060019195-A1 | Photoresist undercoat-forming material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2006-01-26 | — | — | US | claimed |
| EP-0529812-A1 | Thermally-responsive record material | APPLETON PAPERS INC. (US) | 1993-03-03 | — | — | EP | claimed |
| US-5124307-A | Electron donating dye precursor, fluorene bisphenol, binder; fade-resistant images | APPLETON PAPERS INC. (US) | 1992-06-23 | — | — | US | claimed |
| EP-4184248-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND AND POLYMER FOR FORMING ORGANIC FILM | SHINETSU CHEMICAL CO (JP) | 2026-04-15 | — | — | EP | disclosed |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | KIOXIA CORPORATION (JP) | 2026-03-31 | — | — | US | disclosed |
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-03-24 | — | — | US | disclosed |
| EP-4398037-B1 | COMPOUND FOR FORMING METAL-CONTAINING FILM, COMPOSITION FOR FORMING METAL-CONTAINING FILM, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2026-01-21 | — | — | EP | disclosed |
| EP-4660703-A2 | METAL-CONTAINING FILM PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2025-12-10 | — | — | EP | disclosed |
| EP-4239408-B1 | COMPOSITION FOR FORMING ORGANIC FILM, PATTERNING PROCESS, AND COMPOUND | SHINETSU CHEMICAL CO (JP) | 2025-12-10 | — | — | EP | disclosed |
| US-20250372377-A1 | METAL-CONTAINING FILM PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-12-04 | — | — | US | disclosed |
| US-20030027942-A1 | Resin composition , adhesive prepared therewith for bonding circuit members,and circuit boards | HITACHI CHEMICAL CO., LTD. (JP) | 2003-02-06 | — | — | US | disclosed |
| JP-2002363147-A | 9,9-BIS(3-AMINO-5-ALKYL-4-HYDROXYPHENYL)FLUORENE AND METHOD FOR PRODUCING THE SAME | NIPPON KAYAKU CO LTD | 2002-12-18 | — | — | JP | disclosed |
| US-20020055550-A1 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating | SHIN-ETSU CHEMICAL CO. LTD. (JP) | 2002-05-09 | — | — | US | disclosed |
| EP-1186624-A1 | Organosiloxane polymers and photo-curable resin compositions | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2002-03-13 | — | — | EP | disclosed |
| US-6136521-A | POLYORGANOSILOXANE-CONTAINING POLYCARBONATE | IDEMITSU KOSAN CO., LTD. (JP) | 2000-10-24 | — | — | US | disclosed |
| EP-0896975-A1 | POLYCARBONATE, AND MOLDING AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1999-02-17 | — | — | EP | disclosed |
| EP-0529812-A1 | Thermally-responsive record material | APPLETON PAPERS INC. (US) | 1993-03-03 | — | — | EP | disclosed |
| US-5124307-A | Electron donating dye precursor, fluorene bisphenol, binder; fade-resistant images | APPLETON PAPERS INC. (US) | 1992-06-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12584023-B2 | Composition for forming organic film, patterning process, and compound | F12, MLX, F11 | ESR1 1891/4885ESR2 2260/4885GABRA1 4252/4885 |
| US-12590173-B2 | Composition, pattern forming method, semiconductor device, and method for manufacturing semiconductor device | TET2, SDC2, TST | ESR1 1651/4885ESR2 2468/4885GABRA1 4163/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.