Water

Water

SCHEMBL21986451

O.[Cl-].[Cl-].[Cl-].[Cl-].[W+4]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL72335 0.82 — —
Water SCHEMBL21379772 0.67 — —
Water SCHEMBL22558537 0.67 — —
Water SCHEMBL21293770 0.67 — —
Water SCHEMBL25188536 0.67 — —
Water SCHEMBL23631871 0.67 — —
Water SCHEMBL23461833 0.67 — —
Water SCHEMBL25334174 0.67 — —
Water SCHEMBL20562889 0.67 — —
Water SCHEMBL20838826 0.67 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113122866-A Preparation method of nitrogen-doped molybdenum and tungsten carbide nano material electrocatalyst 西北大学 2021-07-16 — — CN claimed
EP-3660079-B1 INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT, DISPERSION CONTAINING INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT, INFRARED-ABSORBING-MATERIAL-CONTAINING INK, ANTI-COUNTERFEITING INK EMPLOYING SAME, ANTI-COUNTERFEITING PRINT FILM, AND METHOD FOR MANUFACTURING INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT SUMITOMO METAL MINING CO (JP) 2025-07-16 — — EP disclosed
US-11787949-B2 Infrared absorbing fine particle dispersed powder, dispersion liquid containing infrared absorbing fine particle dispersed powder, ink containing infrared absorbing fine particle dispersed powder, and anti-counterfeit ink, and anti-counterfeit printed matter SUMITOMO METAL MINING CO., LTD. (JP) 2023-10-17 — — US disclosed
CN-113122866-A Preparation method of nitrogen-doped molybdenum and tungsten carbide nano material electrocatalyst 西北大学 2021-07-16 — — CN disclosed
CN-113122866-A Preparation method of nitrogen-doped molybdenum and tungsten carbide nano material electrocatalyst 西北大学 2021-07-16 — — CN disclosed
US-20200283586-A1 PULVERIZED MASTERBATCH PRODUCTS CONTAINING INFRARED ABSORBING FINE PARTICLES, DISPERSION LIQUID CONTAINING PULVERIZED MASTERBATCH PRODUCTS CONTAINING INFRARED ABSORBING FINE PARTICLES, INK CONTAINING INFRARED ABSORBING MATERIAL, AND ANTI-COUNTERFEIT INK AND ANTI-COUNTERFEIT PRINTED MATTER USING THEM, AND METHOD FOR PRODUCING THE PULVERIZED MASTERBATCH PRODUCTS CONTAINING INFRARED ABSORBING FINE PARTICLES SUMITOMO METAL MINING CO., LTD. (JP) 2020-09-10 — — US disclosed
US-20200270464-A1 INFRARED ABSORBING FINE PARTICLE DISPERSED POWDER, DISPERSION LIQUID CONTAINING INFRARED ABSORBING FINE PARTICLE DISPERSED POWDER, INK CONTAINING INFRARED ABSORBING FINE PARTICLE DISPERSED POWDER, AND ANTI-COUNTERFEIT INK, AND ANTI-COUNTERFEIT PRINTED MATTER SUMITOMO METAL MINING CO., LTD. (JP) 2020-08-27 — — US disclosed
EP-3660107-A1 INFRARED ABSORBING FINE PARTICLE DISPERSION POWDER, DISPERSION LIQUID CONTAINING INFRARED ABSORBING FINE PARTICLE DISPERSION POWDER, INK CONTAINING INFRARED ABSORBING FINE PARTICLE DISPERSION POWDER, ANTI-COUNTERFEIT INK, AND PRINTED MATTER FOR ANTI-COUNTERFEITING Sumitomo Metal Mining Co., Ltd. (JP) 2020-06-03 — — EP disclosed
EP-3660079-A1 INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT, DISPERSION CONTAINING INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT, INFRARED-ABSORBING-MATERIAL-CONTAINING INK, ANTI-COUNTERFEITING INK EMPLOYING SAME, ANTI-COUNTERFEITING PRINT FILM, AND METHOD FOR MANUFACTURING INFRARED-ABSORBING-FINE-PARTICLE-CONTAINING MASTERBATCH PULVERIZED PRODUCT Sumitomo Metal Mining Co., Ltd. (JP) 2020-06-03 — — EP disclosed
CN-107670676-A The preparation method and applications of the cadmium sulfide molybdenum sulfide tungsten sulfide heterojunction photocatalysis composite of one species sea urchin shape structure 温州大学新材料与产业技术研究院 2018-02-09 — — CN disclosed
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