Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.48 |
| ▸ | RORA | P35398 | 1/20 | 0.44 |
| ▸ | HSD11B1 | P28845 | 7/20 | 0.43 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.43 |
| ▸ | CA1 | P00915 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 2/20 | 0.41 |
| ▸ | CA9 | Q16790 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | UQCRB | P14927 | 2/20 | 0.40 |
| ▸ | BCHE | P06276 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 3/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL387181 | 0.95 | HSD11B1 (0.50) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL3136709 | 0.95 | HSD11B1 (0.50) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL2436995 | 0.86 | ALDH1A1 (0.46) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL2438154 | 0.86 | ALDH1A1 (0.46) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL1803692 | 0.85 | KIF11 (0.47) | ALDH1A1HSD11B1CA1CA2CA9 | |
| SCHEMBL2438821 | 0.84 | HSD11B1 (0.47) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL2435496 | 0.84 | HSD11B1 (0.47) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL1593146 | 0.83 | RORA (0.43) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL51946 | 0.82 | CA1 (0.43) | ALDH1A1RORAHSD11B1HSD17B3CA1 | |
| SCHEMBL36225 | 0.81 | GAA (0.45) | ALDH1A1CA1CA2CA9GAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 181 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2728408-B1 | Deep-ultraviolet chemically-amplified positive photoresist | BOE TECHNOLOGY GROUP CO LTD (CN) | 2015-07-15 | — | — | EP | claimed |
| US-9023590-B2 | Deep-ultraviolet chemically-amplified positive photoresist | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-05-05 | — | — | US | claimed |
| EP-1099983-B1 | Chemically amplified positive resist composition and patterning method | SHINETSU CHEMICAL CO (JP) | 2014-08-06 | — | — | EP | claimed |
| EP-2728408-A1 | Deep-ultraviolet chemically-amplified positive photoresist | Boe Technology Group Co. Ltd. (CN) | 2014-05-07 | — | — | EP | claimed |
| US-20140120474-A1 | Deep-Ultraviolet Chemically-Amplified Positive Photoresist | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2014-05-01 | — | — | US | claimed |
| US-11021572-B2 | Photosensitive resin composition, cured product of same, interlayer insulating film, surface protective film and electronic component | HD MICROSYSTEMS, LTD. (JP) | 2021-06-01 | — | — | US | disclosed |
| US-20190161580-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT OF SAME, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM AND ELECTRONIC COMPONENT | HD MICROSYSTEMS, LTD. (JP) | 2019-05-30 | — | — | US | disclosed |
| US-10025188-B2 | Resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20170322492-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-11-09 | — | — | US | disclosed |
| US-20160320705-A1 | RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2016-11-03 | — | — | US | disclosed |
| US-9348226-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2016-05-24 | — | — | US | disclosed |
| US-9329478-B2 | Polysiloxane composition and pattern-forming method | JSR CORPORATION (JP) | 2016-05-03 | — | — | US | disclosed |
| US-6168897-B1 | PATTERNWISE-EXPOSING THE LAMINATED LAYER COMPRISING LIGHT SENSITIVE LAYER AND FLUORESCENT LIGHT-GENERATING LAYER TO ELECTROMAGNETIC RADIATION AND AN ELECTRON BEAM TO GENERATE A FLUORESCENT LIGHT CAUSING PHOTOCHEMICAL REACTION, DEVELOPING | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-01-02 | — | — | US | disclosed |
| EP-1033624-A1 | RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE | Clariant International Ltd. (CH) | 2000-09-06 | — | — | EP | disclosed |
| US-5928841-A | Method of photoetching at 180 to 220 | KABUSHIKI KAISHA TOSHIBA (JP) | 1999-07-27 | — | — | US | disclosed |
| US-RE35821-E | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-06-09 | — | — | US | disclosed |
| US-5753407-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1998-05-19 | — | — | US | disclosed |
| US-5585217-A | Polyamic acid composition | KABUSHIKI KAISHA TOSHIBA (JP) | 1996-12-17 | — | — | US | disclosed |
| US-5449705-A | Silicon-containing polyamic acid derivative and photosensitive resin composition using it | CHISSO CORPORATION (JP) | 1995-09-12 | — | — | US | disclosed |
| US-5326675-A | Pattern forming method including the formation of an acidic coating layer on the radiation-sensitive layer | KABUSHIKI KAISHA TOSHIBA (JP) | 1994-07-05 | — | — | US | disclosed |