Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 10/20 | 0.50 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.44 |
| ▸ | UQCRB | P14927 | 1/20 | 0.43 |
| ▸ | HSD17B2 | P37059 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | RECQL | P46063 | 1/20 | 0.43 |
| ▸ | RAB9A | P51151 | 1/20 | 0.43 |
| ▸ | RORA | P35398 | 1/20 | 0.41 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.39 |
| ▸ | CA1 | P00915 | 1/20 | 0.39 |
| ▸ | CA2 | P00918 | 1/20 | 0.39 |
| ▸ | MAOA | P21397 | 1/20 | 0.39 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3136709 | 1.00 | HSD11B1 (0.50) | HSD11B1HSD17B3ALDH1A1UQCRBHSD17B2 | |
| SCHEMBL220568 | 0.95 | ALDH1A1 (0.48) | HSD11B1HSD17B3ALDH1A1UQCRBHSD17B2 | |
| SCHEMBL2435496 | 0.89 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1UQCRBHSD17B2 | |
| SCHEMBL2438821 | 0.89 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1UQCRBHSD17B2 | |
| SCHEMBL1261245 | 0.87 | HSD11B1 (0.45) | HSD11B1ALDH1A1NR1H3KDM4ECA1 | |
| SCHEMBL3134858 | 0.87 | HSD11B1 (0.45) | HSD11B1ALDH1A1NR1H3KDM4ECA1 | |
| SCHEMBL37033 | 0.86 | HTR6 (0.42) | HSD11B1ALDH1A1NR1H3KDM4ECA1 | |
| SCHEMBL384050 | 0.86 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1NPC1RECQL | |
| SCHEMBL16893272 | 0.86 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1UQCRBHSD17B2 | |
| SCHEMBL3139776 | 0.86 | HSD11B1 (0.47) | HSD11B1HSD17B3ALDH1A1NPC1RECQL |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 615 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-104823110-B | Photosensitive resin composition, photosensitive film, and method for forming resist pattern | 昭和电工材料株式会社 | 2021-06-04 | — | — | CN | claimed |
| EP-2728408-B1 | Deep-ultraviolet chemically-amplified positive photoresist | BOE TECHNOLOGY GROUP CO LTD (CN) | 2015-07-15 | — | — | EP | claimed |
| US-9023590-B2 | Deep-ultraviolet chemically-amplified positive photoresist | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2015-05-05 | — | — | US | claimed |
| EP-2728408-A1 | Deep-ultraviolet chemically-amplified positive photoresist | Boe Technology Group Co. Ltd. (CN) | 2014-05-07 | — | — | EP | claimed |
| US-20140120474-A1 | Deep-Ultraviolet Chemically-Amplified Positive Photoresist | BOE TECHNOLOGY GROUP CO., LTD. (CN) | 2014-05-01 | — | — | US | claimed |
| US-20070190465-A1 | Positively radiation-sensitive resin composition | JSR CORPORATION (JP) | 2007-08-16 | — | — | US | claimed |
| US-20070031758-A1 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | claimed |
| EP-1750176-A2 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR Corporation (JP) | 2007-02-07 | — | — | EP | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| US-5976760-A | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-11-02 | — | — | US | claimed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2026-03-19 | — | — | US | disclosed |
| US-5789136-A | Negative-working photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-08-04 | — | — | US | disclosed |
| US-5744511-A | BLEND OF COUMARIN DYES, ACID GENERATOR AND ARYL BORATE | TOKUYAMA CORPORATION (JP) | 1998-04-28 | — | — | US | disclosed |
| EP-0821274-A1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1998-01-28 | — | — | EP | disclosed |
| EP-0738928-A2 | Visible-ray polymerization initiator and visible-ray polymerizable composition | TOKUYAMA CORPORATION (JP) | 1996-10-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260077385-A1 | FILM FORMING METHOD, CURABLE COMPOSITION, AND ARTICLE MANUFACTURING METHOD | EEF1D, RHOA, YWHAH | HSD11B1 3683/4885HSD17B3 3747/4885ALDH1A1 4238/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.