SCHEMBL22097551

SCHEMBL22097551

O=C(CCCOC(=O)c1c(I)ccc(I)c1I)NS(=O)(=O)C(F)(F)F

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
▸ CXCR2 P25025 1/20 0.34
▸ MMP2 P08253 2/20 0.31
▸ MMP9 P14780 2/20 0.31
▸ MMP12 P39900 2/20 0.31
▸ CA1 P00915 1/20 0.30
▸ CA2 P00918 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22097546 0.93 MMP2 (0.32) CXCR2MMP2MMP9MMP12CA1
SCHEMBL22097549 0.85 KMT2A (0.36) MMP2MMP9MMP12
SCHEMBL24361331 0.79 HDAC1 (0.42) CXCR2
SCHEMBL22097548 0.73 MAPK1 (0.35) CA1CA2
SCHEMBL24966436 0.73 L3MBTL1 (0.31) —
SCHEMBL26343814 0.71 HDAC3 (0.39) CXCR2
SCHEMBL26586803 0.70 ESR1 (0.37) —
SCHEMBL22097535 0.70 TRPV1 (0.37) —
SCHEMBL25496012 0.70 ESR1 (0.30) —
SCHEMBL22097538 0.68 VCP (0.35) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-11774853-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-03 — — US disclosed
US-20200192222-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-06-18 — — US disclosed
Send feedback