Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | PKM | P14618 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16807393 | 0.82 | ALDH1A1 (0.36) | ALDH1A1 | |
| SCHEMBL25468026 | 0.80 | KDM4E (0.31) | KDM4EALDH1A1 | |
| SCHEMBL22201019 | 0.79 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL16807397 | 0.79 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL10242688 | 0.78 | ALDH1A1 (0.33) | LMNAALDH1A1 | |
| SCHEMBL15470551 | 0.77 | LMNA (0.54) | LMNACYP3A4ALOX15ALDH1A1 | |
| SCHEMBL16018499 | 0.74 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL14825615 | 0.73 | HRH3 (0.35) | KDM4EALDH1A1 | |
| SCHEMBL14825616 | 0.71 | MTNR1A (0.41) | — | |
| SCHEMBL16807396 | 0.69 | EPHX2 (0.34) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |
| US-20230185192-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-15 | — | — | US | disclosed |