Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.33 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.32 |
| ▸ | THRB | P10828 | 1/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.31 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | TSHR | P16473 | 3/20 | 0.31 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.30 |
| ▸ | CHRM4 | P08173 | 1/20 | 0.30 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.30 |
| ▸ | CHRM3 | P20309 | 1/20 | 0.30 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22201019 | 0.98 | ALDH1A1 (0.34) | ALDH1A1THRBTSHRGAA | |
| SCHEMBL16807397 | 0.95 | ALDH1A1 (0.34) | ALDH1A1THRBTSHRGAA | |
| SCHEMBL16807393 | 0.92 | ALDH1A1 (0.36) | ALDH1A1THRBTSHR | |
| SCHEMBL9609262 | 0.83 | LMNA (0.36) | ALDH1A1EPHX1MEN1LMNAALOX12 | |
| SCHEMBL171954 | 0.82 | ALDH1A1 (0.34) | ALDH1A1EPHX1THRBTSHRCHRM2 | |
| SCHEMBL8407098 | 0.82 | ALDH1A1 (0.34) | ALDH1A1EPHX1THRBTSHR | |
| SCHEMBL9609264 | 0.81 | LMNA (0.37) | EPHX1LMNASMN1; SMN2CHRM2CHRM4 | |
| SCHEMBL22201018 | 0.80 | ALDH1A1 (0.35) | ALDH1A1EPHX1THRBTSHR | |
| SCHEMBL15132676 | 0.80 | PDK1 (0.33) | EPHX1 | |
| SCHEMBL15134089 | 0.80 | PDK1 (0.33) | EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305398-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20200341376-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID | JSR CORPORATION (JP) | 2020-10-29 | — | — | US | disclosed |
| US-20200218154-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-07-09 | — | — | US | disclosed |
| US-9261785-B2 | Polymer compound, resin composition for photoresists, and method for producing semiconductor | DAICEL CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-9261785-B2 | Polymer compound, resin composition for photoresists, and method for producing semiconductor | DAICEL CORPORATION (JP) | 2016-02-16 | — | — | US | disclosed |
| US-20150168831-A1 | POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR | DAICEL CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20150168831-A1 | POLYMER COMPOUND, RESIN COMPOSITION FOR PHOTORESISTS, AND METHOD FOR PRODUCING SEMICONDUCTOR | DAICEL CORPORATION (JP) | 2015-06-18 | — | — | US | disclosed |
| US-20130045443-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-21 | — | — | US | disclosed |
| US-20130045443-A1 | POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-02-21 | — | — | US | disclosed |
| EP-2450746-A1 | Positive resist composition and pattern forming method using the composition | Fujifilm Corporation (JP) | 2012-05-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20200341376-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND AND METHOD OF GENERATING ACID | RER1, TAS1R1, RAD51 | ALDH1A1 448/4885EPHX1 869/4885THRB 2267/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.