Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL92325 | 0.89 | ALDH1A1 (0.34) | TSHR | |
| SCHEMBL12119737 | 0.81 | TSHR (0.32) | TSHR | |
| SCHEMBL973203 | 0.79 | PRKCA (0.32) | — | |
| SCHEMBL12119738 | 0.78 | TSHR (0.32) | TSHR | |
| SCHEMBL15216311 | 0.78 | OPRK1 (0.33) | — | |
| SCHEMBL11964321 | 0.77 | TSHR (0.37) | TSHR | |
| SCHEMBL12159365 | 0.77 | TSHR (0.32) | TSHR | |
| SCHEMBL16820425 | 0.76 | ALDH1A1 (0.31) | TSHR | |
| Lithium Ion SCHEMBL16820427 | 0.76 | ALDH1A1 (0.31) | TSHR | |
| SCHEMBL6117936 | 0.76 | ELANE (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10234757-B2 | Polymer, making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-2664633-B1 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2018-11-07 | — | — | EP | disclosed |
| US-9146464-B2 | Sulfonium salt, polymer, polymer making method, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-09-29 | — | — | US | disclosed |
| US-8957160-B2 | Preparation of polymer, resulting polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-17 | — | — | US | disclosed |
| US-20140162189-A1 | SULFONIUM SALT, POLYMER, POLYMER MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-12 | — | — | US | disclosed |
| EP-2664633-A1 | Polymer, making method, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-11-20 | — | — | EP | disclosed |
| US-20130224660-A1 | PREPARATION OF POLYMER, RESULTING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20130224659-A1 | POLYMER, MAKING METHOD, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-08-29 | — | — | US | disclosed |
| EP-2631253-A2 | Preparation of polymer, resulting polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2013-08-28 | — | — | EP | disclosed |
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-08-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110189607-A1 | NOVEL SULFONIUM SALT, POLYMER, METHOD FOR PRODUCING THE POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS | RPS4Y1, ETV6, RPS4X | TSHR 3175/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.