Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Ethasulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 6/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 5/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | RECQL | P46063 | 3/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | GLA | P06280 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.44 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.44 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.44 |
| ▸ | CA2 | P00918 | 4/20 | 0.42 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | MMP9 | P14780 | 1/20 | 0.37 |
| ▸ | MMP8 | P22894 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethasulfuric Acid SCHEMBL30312334 | 0.96 | CYP3A4 (0.50) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL4595626 | 0.96 | CYP3A4 (0.50) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL57666 | 0.96 | CYP3A4 (0.50) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL17456529 | 0.96 | CYP3A4 (0.50) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL27915134 | 0.95 | CYP3A4 (0.49) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL1416426 | 0.89 | DNM1 (0.47) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL23387498 | 0.87 | RECQL (0.67) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Ethasulfuric Acid SCHEMBL29695271 | 0.86 | RECQL (0.65) | CYP3A4L3MBTL1TSHRTDP1ATM | |
| Potassium Ion SCHEMBL27795622 | 0.85 | RECQL (0.53) | TSHRRECQLMAPK1GLAHPGD | |
| SCHEMBL27224578 | 0.85 | CA2 (0.52) | CYP3A4L3MBTL1TSHRTDP1ATM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3514201-B1 | CRYSTAL NUCLEATOR FOR POLYOLEFIN RESINS | NEW JAPAN CHEM CO LTD (JP) | 2026-01-28 | — | — | EP | disclosed |
| WO-2025110076-A1 | DIACETAL COMPOSITION, POLYOLEFIN-BASED RESIN COMPOSITION, MOLDED POLYOLEFIN-BASED RESIN, AND METHOD FOR PRODUCING MOLDED POLYOLEFIN-BASED RESIN | 新日本理化株式会社 | 2025-05-30 | — | — | WO | disclosed |
| US-11746211-B2 | Crystal nucleator for polyolefin resins, method for producing crystal nucleator for polyolefin resins, and method for improving fluidity of crystal nucleator for polyolefin resins | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2023-09-05 | — | — | US | disclosed |
| CN-113354985-B | Ink set and image forming method | 富士胶片株式会社 | 2023-01-03 | — | — | CN | disclosed |
| CN-114685852-A | Crystal nucleating agent for polyolefin resin, method for producing same, method for improving fluidity, polyolefin resin composition, and molded article | 新日本理化株式会社 | 2022-07-01 | — | — | CN | disclosed |
| CN-106661359-B | Powder composition | 索尔维特殊聚合物意大利有限公司 | 2022-01-11 | — | — | CN | disclosed |
| CN-113354985-A | Ink set and image forming method | 富士胶片株式会社 | 2021-09-07 | — | — | CN | disclosed |
| CN-105838143-B | Ink set and image forming method | 富士胶片株式会社 | 2021-06-15 | — | — | CN | disclosed |
| US-11001721-B2 | Powder composition | SOLVAY SPECIALTY POLYMERS ITALY S.P.A. (IT) | 2021-05-11 | — | — | US | disclosed |
| EP-3290486-B1 | INK SET AND IMAGE FORMING METHOD | FUJIFILM CORP (JP) | 2020-09-23 | — | — | EP | disclosed |
| US-4822862-A | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol | HOECHST CELANESE CORPORATION (US) | 1989-04-18 | — | — | US | disclosed |
| EP-0277721-A2 | Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol) | HOECHST CELANESE CORPORATION (US) | 1988-08-10 | — | — | EP | disclosed |
| US-4357428-A | FABRICS, USING A ETHOXYLATED ALKYLPHENOL, A SULFOSUCCINAMATE AND ALKYL SULFATE | UNION CARBIDE CORPORATION (US) | 1982-11-02 | — | — | US | disclosed |
| US-4325831-A | Foamable composition | UNION CARBIDE CORPORATION (US) | 1982-04-20 | — | — | US | disclosed |
| US-4296225-A | Stable vinyl acetate and amine monomer copolymer emulsions | CELANESE CORPORATION (US) | 1981-10-20 | — | — | US | disclosed |
| US-4042476-A | TITANIUM DIOXIDE-ACRYLIC POLYMER EMULSION | CELANESE CORPORATION (US) | 1977-08-16 | — | — | US | disclosed |
| US-4022743-A | POLYACRYLATE ESTER OF PENTAERYTHRITOLHYDROXYMETHYL DIACETONE ACRYLAMIDE COPOLYMERS HAVING IMPROVED ADHESION PROPERTIES | CELANESE CORPORATION (US) | 1977-05-10 | — | — | US | disclosed |
| US-4010126-A | Aqueous emulsion copolymers of vinyl alkanoates, alkyl, acrylates, and acrylic modified alkyds | CELANESE CORPORATION (US) | 1977-03-01 | — | — | US | disclosed |
| US-4003871-A | LYPOPHILIC AND HYDROPHILIC INITIATORS | CELANESE CORPORATION (US) | 1977-01-18 | — | — | US | disclosed |
| US-3973998-A | Rinsing solutions for acid cleaned iron and steel surfaces | CELANESE COATINGS & SPECIALTIES COMPANY (US) | 1976-08-10 | — | — | US | disclosed |