SCHEMBL2308323

SCHEMBL2308323

CC(C)(C)OC(=O)C(F)(F)Cl

nearest known ligand 0.46

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
DGAT1 O75907 1/20 0.46
MAPT P10636 1/20 0.33
CA14 Q9ULX7 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4246491 0.90 DGAT1 (0.36) DGAT1
SCHEMBL3895308 0.78 DGAT1 (0.50) DGAT1MAPT
SCHEMBL1456408 0.78 DGAT1 (0.50) DGAT1MAPT
SCHEMBL14213166 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL1714208 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL22296098 0.78 DGAT1 (0.50) DGAT1CA14
SCHEMBL1405453 0.77
Hydrochloric Acid SCHEMBL28000852 0.76 DGAT1 (0.48) DGAT1CA14
SCHEMBL8713356 0.76 DGAT1 (0.48) DGAT1MAPT
SCHEMBL15147713 0.74 DGAT1 (0.46) DGAT1CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110536885-B Process for producing difluoromethylene compound 佐藤制药株式会社 2024-03-08 CN disclosed
US-11084792-B2 Method for producing difluoromethylene compound SATO PHARMACEUTICAL CO., LTD. (JP) 2021-08-10 US disclosed
US-20200190038-A1 METHOD FOR PRODUCING DIFLUOROMETHYLENE COMPOUND SATO PHARMACEUTICAL CO., LTD. (JP) 2020-06-18 US disclosed
EP-3617197-A1 METHOD FOR PRODUCING DIFLUOROMETHYLENE COMPOUND Sato Pharmaceutical Co., Ltd. (JP) 2020-03-04 EP disclosed
US-8304443-B2 Indazole derivatives ASAHI KASEI PHARMA CORPORATION (JP) 2012-11-06 US disclosed
US-20120225909-A1 INDAZOLE ANALOG ASAHI KASEI PHARMA CORPORATION (JP) 2012-09-06 US disclosed
EP-2484668-A1 INDAZOLE ANALOGUE Asahi Kasei Pharma Corporation (JP) 2012-08-08 EP disclosed
EP-2351742-A1 INDAZOLE DERIVATIVE Asahi Kasei Pharma Corporation (JP) 2011-08-03 EP disclosed
US-20100152265-A1 INDAZOLE DERIVATIVES ASAHI KASEI PHARMA CORPORATION (JP) 2010-06-17 US disclosed
US-20060293343-A1 Pyrimidine derivatives ASAHI KASEI PHARMA CORPORATION (JP) 2006-12-28 US disclosed
US-5827634-A FOR DEEP ULTRAVIOLET EXPOSURE; RESOLUTION SHIPLEY COMPANY, L.L.C. (US) 1998-10-27 US disclosed
US-5763536-A PHOTORESIST BINDER CONSISTING OF NOVOLAK RESIN OR POLYVINYLPHENOL RESIN SHIPLEY COMPANY, L.L.C. (US) 1998-06-09 US disclosed
US-5731386-A Polymer for positive acid catalyzed resists SHIPLEY COMPANY, L.L.C. (US) 1998-03-24 US disclosed
US-5700624-A Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups SHIPLEY COMPANY, L.L.C. (US) 1997-12-23 US disclosed
US-5618951-A REACTING A CHLORODIFLUOROACETATE WITH A HALOSILANE USING AN UREA SILVENT AND A REDUCING AGENT ELI LILLY AND COMPANY (US) 1997-04-08 US disclosed
EP-0742490-A1 Positive acid catalized resists Shipley Company LLC (US) 1996-11-13 EP disclosed
EP-0655454-A1 Process for preparing 2,2-difluoroketene silyl acetals and a,a-difluoro-b-silyloxy-1,3-dioxolane-4-propanoic acid esters ELI LILLY AND COMPANY (US) 1995-05-31 EP disclosed
US-5384229-A Resin with acid labile groups, photoacid generator, photoresists, printed circuits SHIPLEY COMPANY INC. (US) 1995-01-24 US disclosed
US-5362600-A Radiation sensitive compositions comprising polymer having acid labile groups SHIPLEY COMPANY INC. (US) 1994-11-08 US disclosed
US-5258257-A Radiation sensitive compositions comprising polymer having acid labile groups SHIPLEY COMPANY INC. (US) 1993-11-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120225909-A1 INDAZOLE ANALOG ADRB3, ADRB1, ADRB2 DGAT1 1778/4885MAPT 1048/4885CA14 4260/4885
US-20060293343-A1 Pyrimidine derivatives PDE4A, PDE4B, PDE5A DGAT1 2182/4885MAPT 3800/4885CA14 2302/4885
US-20200190038-A1 METHOD FOR PRODUCING DIFLUOROMETHYLENE COMPOUND HACL2, MGLL, ABL1 DGAT1 597/4885MAPT 4687/4885CA14 3464/4885
US-20100152265-A1 INDAZOLE DERIVATIVES ADRB3, INSR, ADRB1 DGAT1 1010/4885MAPT 748/4885CA14 3770/4885
US-11084792-B2 Method for producing difluoromethylene compound HACL2, MGLL, ABL1 DGAT1 597/4885MAPT 4687/4885CA14 3464/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.