SCHEMBL23382492

SCHEMBL23382492

COC(C)Oc1ccc(C(=O)OCC(F)(F)C(=O)O)cc1

nearest known ligand 0.40

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
▸ KMT2A Q03164 3/20 0.40
▸ MAPK1 P28482 1/20 0.40
▸ HIF1A Q16665 1/20 0.40
▸ ADRB2 P07550 1/20 0.39
▸ ADRB1 P08588 1/20 0.39
▸ ADRB3 P13945 1/20 0.39
▸ MEN1 O00255 2/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ MAPT P10636 3/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ TP53 P04637 1/20 0.36
▸ HPGD P15428 1/20 0.36
▸ ESR2 Q92731 1/20 0.36
▸ GAA P10253 1/20 0.36
▸ PARP10 Q53GL7 1/20 0.36
▸ RAB9A P51151 1/20 0.35
▸ ACHE P22303 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382493 0.88 KMT2A (0.37) KMT2AMAPK1HIF1AADRB2ADRB1
SCHEMBL23383013 0.80 MAPK1 (0.39) MAPK1HIF1AADRB2ADRB1ADRB3
SCHEMBL23382688 0.80 TP53 (0.43) KMT2AMAPK1HIF1AADRB2ADRB1
SCHEMBL23382491 0.80 MAPT (0.43) MAPK1HIF1AALDH1A1MAPTSMN1; SMN2
SCHEMBL23382690 0.79 TP53 (0.47) KMT2AMAPK1HIF1AMEN1ALDH1A1
SCHEMBL23383015 0.79 MAPK1 (0.45) KMT2AMAPK1HIF1AALDH1A1MAPT
SCHEMBL23382693 0.78 SMN1; SMN2 (0.44) MAPK1HIF1AMAPTSMN1; SMN2TP53
SCHEMBL23559376 0.78 RAB9A (0.51) KMT2AMAPK1HIF1AADRB2ADRB1
SCHEMBL24361312 0.76 ESR1 (0.53) KMT2AMAPK1HIF1AADRB2ADRB1
SCHEMBL24361126 0.76 MAPK1 (0.67) KMT2AMAPK1HIF1AADRB2ADRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 KMT2A 2745/4885MAPK1 229/4885HIF1A 4225/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 KMT2A 2745/4885MAPK1 229/4885HIF1A 4225/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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