SCHEMBL23383013

SCHEMBL23383013

COC(OC(=O)c1ccc(C(=O)OCC(F)(F)C(=O)O)cc1)C(C)C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPK1 P28482 1/20 0.39
▸ HIF1A Q16665 1/20 0.39
▸ MAPT P10636 1/20 0.37
▸ PDCD1 Q15116 1/20 0.36
▸ CD274 Q9NZQ7 1/20 0.36
▸ CA12 O43570 2/20 0.36
▸ CA1 P00915 2/20 0.36
▸ CA2 P00918 2/20 0.36
▸ CA7 P43166 2/20 0.36
▸ CA9 Q16790 2/20 0.36
▸ CA14 Q9ULX7 2/20 0.36
▸ CYP4F2 P78329 1/20 0.35
▸ CYP4A11 Q02928 1/20 0.35
▸ ACHE P22303 1/20 0.34
▸ HTR1A P08908 1/20 0.34
▸ CYP2D6 P10635 1/20 0.34
▸ SCN1A P35498 1/20 0.34
▸ SLC6A3 Q01959 1/20 0.34
▸ SCN5A Q14524 1/20 0.34
▸ SCN2A Q99250 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23382493 0.87 KMT2A (0.37) MAPK1HIF1AMAPTACHEADRB2
SCHEMBL23382492 0.80 KMT2A (0.40) MAPK1HIF1AMAPTACHEADRB2
SCHEMBL23383160 0.78 PDCD1 (0.38) MAPTPDCD1CD274CA12CA1
SCHEMBL23383015 0.77 MAPK1 (0.45) MAPK1HIF1AMAPTCA12CA1
SCHEMBL23559376 0.77 RAB9A (0.51) MAPK1HIF1AMAPTCA12CA1
SCHEMBL24361312 0.75 ESR1 (0.53) MAPK1HIF1AMAPTCA12CA1
SCHEMBL16809098 0.75 TSHR (0.53) MAPTPDCD1CD274CA12CA1
SCHEMBL24361126 0.75 MAPK1 (0.67) MAPK1HIF1AHTR1ACYP2D6SCN1A
SCHEMBL23382489 0.75 MAPK1 (0.45) MAPK1HIF1ACA12CA1CA2
SCHEMBL24361313 0.74 CES2 (0.48) MAPK1HIF1AMAPTLMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-09-19 — — US disclosed
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-05-20 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11762287-B2 Onium salt compound, chemically amplified resist composition and patterning process IDUA, SLC6A5, SLC6A9 MAPK1 229/4885HIF1A 4225/4885MAPT 1694/4885
US-20210149301-A1 ONIUM SALT COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS IDUA, SLC6A5, SLC6A9 MAPK1 229/4885HIF1A 4225/4885MAPT 1694/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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