SCHEMBL234049

SCHEMBL234049

CCNC(NCC)[SiH2]c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 3/20 0.44
KCNN4 O15554 1/20 0.34
TAAR1 Q96RJ0 3/20 0.32
AOC3 Q16853 1/20 0.32
MTOR P42345 1/20 0.32
RAB9A P51151 1/20 0.32
GRM7 Q14831 1/20 0.32
TP53 P04637 1/20 0.32
PKM P14618 1/20 0.32
LMNA P02545 1/20 0.31
CYP3A4 P08684 1/20 0.31
ALOX15 P16050 1/20 0.31
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2100214 0.79 SIGMAR1 (0.41) SIGMAR1KCNN4TAAR1AOC3MTOR
SCHEMBL2270806 0.76 SIGMAR1 (0.39) SIGMAR1KCNN4AOC3
SCHEMBL235042 0.75 TAAR1 (0.37) SIGMAR1KCNN4TAAR1AOC3PKM
SCHEMBL2099562 0.72 SIGMAR1 (0.42) SIGMAR1KCNN4MTORRAB9AGRM7
SCHEMBL2103435 0.71 SIGMAR1 (0.41) SIGMAR1KCNN4MTORRAB9AGRM7
SCHEMBL234292 0.71 SIGMAR1 (0.41) SIGMAR1KCNN4LMNACYP3A4ALOX15
SCHEMBL3316312 0.70 LMNA (0.39) TAAR1AOC3TP53LMNATSHR
SCHEMBL28286950 0.70 LMNA (0.39) TAAR1AOC3TP53LMNATSHR
SCHEMBL10001848 0.68 TRPA1 (0.38) SIGMAR1TAAR1AOC3TP53LMNA
SCHEMBL2103176 0.68 SIGMAR1 (0.39) SIGMAR1KCNN4PKMLMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US claimed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP claimed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US claimed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO claimed
US-12049576-B2 Silicone pressure sensitive adhesive and method of making the same MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2024-07-30 US disclosed
EP-4320180-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME Momentive Performance Materials Inc. (US) 2024-02-14 EP disclosed
WO-2022216482-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2022-10-13 WO disclosed
US-20220325154-A1 SILICONE PRESSURE SENSITIVE ADHESIVE AND METHOD OF MAKING THE SAME MOMENTIVE PERFORMANCE MATERIALS INC. 2022-10-13 US disclosed
EP-2360190-B1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO LTD (JP) 2015-10-14 EP disclosed
US-8648001-B2 Aminosilane compounds, catalyst components and catalysts for olefin polymerization, and process for production of olefin polymers with the same TOHO TITANIUM CO., LTD. (JP) 2014-02-11 US disclosed
US-8426537-B2 Solid catalyst component and catalyst for polymerization of olefins, and process for production of olefin polymers using same TOHO TITANIUM CO., LTD. (JP) 2013-04-23 US disclosed
US-8404584-B2 Method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2013-03-26 US disclosed
US-8164166-B2 Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device FUJITSU LIMITED (JP) 2012-04-24 US disclosed
US-20120053310-A1 Aminosilane Compounds, Catalyst Components and Catalysts for Olefin Polymerization, and Process for Production of Olefin Polymers with the Same TOHO TITANIUM CO., LTD. (JP) 2012-03-01 US disclosed
US-20120004378-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME TOHO TITANIUM CO., LTD (JP) 2012-01-05 US disclosed
US-20110207319-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2011-08-25 US disclosed
EP-2360190-A1 SOLID CATALYST COMPONENT AND CATALYST FOR POLYMERIZATION OF OLEFINS, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS USING SAME Toho Titanium CO., LTD. (JP) 2011-08-24 EP disclosed
US-20100190942-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME TOHO CATALYST CO., LTD. (JP) 2010-07-29 US disclosed
US-20090085170-A1 INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE FUJITSU LIMITED (JP) 2009-04-02 US disclosed
EP-1908767-A1 AMINOSILANE COMPOUNDS, CATALYST COMPONENTS AND CATALYSTS FOR OLEFIN POLYMERIZATION, AND PROCESS FOR PRODUCTION OF OLEFIN POLYMERS WITH THE SAME Toho Catalyst Co., Ltd. (JP) 2008-04-09 EP disclosed