Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 4/20 | 0.42 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.33 |
| ▸ | MTOR | P42345 | 1/20 | 0.31 |
| ▸ | RAB9A | P51151 | 1/20 | 0.31 |
| ▸ | GRM7 | Q14831 | 1/20 | 0.31 |
| ▸ | TP53 | P04637 | 1/20 | 0.31 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.30 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2268389 | 0.80 | SIGMAR1 (0.37) | SIGMAR1 | |
| SCHEMBL2104457 | 0.78 | TAAR1 (0.39) | SIGMAR1PKMCYP3A4ALOX15TSHR | |
| SCHEMBL8427323 | 0.73 | TDP1 (0.37) | SIGMAR1CYP3A4ALOX15TSHR | |
| SCHEMBL234049 | 0.72 | SIGMAR1 (0.44) | SIGMAR1KCNN4MTORRAB9AGRM7 | |
| SCHEMBL8512686 | 0.72 | LMNA (0.35) | SIGMAR1RAB9ALMNATSHR | |
| SCHEMBL8727777 | 0.72 | LMNA (0.35) | SIGMAR1RAB9ALMNATSHR | |
| SCHEMBL2103828 | 0.70 | TSHR (0.38) | MTORRAB9AGRM7CYP3A4ALOX15 | |
| SCHEMBL2274476 | 0.70 | KCNN4 (0.35) | SIGMAR1KCNN4TP53LMNAHTT | |
| SCHEMBL11012885 | 0.70 | TDP1 (0.34) | SIGMAR1LMNACYP3A4TSHR | |
| SCHEMBL23521388 | 0.69 | L3MBTL1 (0.39) | TP53PKMHTT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8404584-B2 | Method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2013-03-26 | — | — | US | disclosed |
| US-8164166-B2 | Interfacial roughness reducing film, wiring layer, semiconductor device, and method of manufacturing semiconductor device | FUJITSU LIMITED (JP) | 2012-04-24 | — | — | US | disclosed |
| US-20110207319-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2011-08-25 | — | — | US | disclosed |
| US-20090085170-A1 | INTERFACIAL ROUGHNESS REDUCING FILM, WIRING LAYER, SEMICONDUCTOR DEVICE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJITSU LIMITED (JP) | 2009-04-02 | — | — | US | disclosed |