Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Formic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formic Acid SCHEMBL3134313 | 1.00 | — | — | |
| Formic Acid SCHEMBL198180 | 0.94 | — | — | |
| Formic Acid SCHEMBL11420264 | 0.94 | ALDH1A1 (0.33) | — | |
| Formic Acid SCHEMBL11064588 | 0.94 | ALDH1A1 (0.33) | — | |
| Formic Acid SCHEMBL25270204 | 0.88 | — | — | |
| Formic Acid SCHEMBL20377917 | 0.88 | — | — | |
| Formic Acid SCHEMBL8317739 | 0.88 | — | — | |
| Formic Acid SCHEMBL21542465 | 0.88 | — | — | |
| Formic Acid SCHEMBL3635460 | 0.88 | — | — | |
| Formic Acid SCHEMBL6929507 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4691998-A1 | METHOD FOR PRODUCING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, INK COMPOSITION COMPRISING SAME, LIGHT-EMITTING ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC APPLIANCE | Samsung Display Co., Ltd. (KR) | 2026-02-11 | — | — | EP | claimed |
| WO-2024205099-A1 | METHOD FOR PRODUCING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, INK COMPOSITION COMPRISING SAME, LIGHT-EMITTING ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC APPLIANCE | 삼성디스플레이주식회사 | 2024-10-03 | — | — | WO | claimed |
| US-20240317601-A1 | METHOD OF MANUFACTURING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, AND INK COMPOSITION, LIGHT-EMITTING DEVICE, ELECTRONIC APPARATUS, AND ELECTRONIC DEVICE, EACH INCLUDING THE METAL OXIDE NANOPARTICLES | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-09-26 | — | — | US | claimed |
| EP-4691998-A1 | METHOD FOR PRODUCING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, INK COMPOSITION COMPRISING SAME, LIGHT-EMITTING ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC APPLIANCE | Samsung Display Co., Ltd. (KR) | 2026-02-11 | — | — | EP | disclosed |
| WO-2024205099-A1 | METHOD FOR PRODUCING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, INK COMPOSITION COMPRISING SAME, LIGHT-EMITTING ELEMENT, ELECTRONIC DEVICE, AND ELECTRONIC APPLIANCE | 삼성디스플레이주식회사 | 2024-10-03 | — | — | WO | disclosed |
| WO-2024203547-A1 | MIXED INK, PRODUCTION METHOD FOR SAME, AND PRODUCTION METHOD FOR SINTERED BODY | 三井金属鉱業株式会社 | 2024-10-03 | — | — | WO | disclosed |
| US-20240317601-A1 | METHOD OF MANUFACTURING METAL OXIDE NANOPARTICLES, METAL OXIDE NANOPARTICLES, AND INK COMPOSITION, LIGHT-EMITTING DEVICE, ELECTRONIC APPARATUS, AND ELECTRONIC DEVICE, EACH INCLUDING THE METAL OXIDE NANOPARTICLES | SAMSUNG DISPLAY CO., LTD. (KR) | 2024-09-26 | — | — | US | disclosed |
| CN-112962116-B | ABO3Type double perovskite LaCoyNi1-yO3Nano-rod electrocatalytic material and preparation method thereof | 江南大学 | 2022-05-24 | — | — | CN | disclosed |
| CN-112962116-A | ABO3Type double perovskite LaCoyNi1-yO3Nano-rod electrocatalytic material and preparation method thereof | 江南大学 | 2021-06-15 | — | — | CN | disclosed |
| CN-103429369-B | Method for producing composite nickel nanoparticles | NIPPON STEEL CHEMICAL CO | 2015-06-24 | — | — | CN | disclosed |
| CN-103429369-A | Composite nickel nanoparticles and method for producing same | NIPPON STEEL CHEMICAL CO | 2013-12-04 | — | — | CN | disclosed |
| US-8007692-B2 | Coating liquid for nickel film formation, nickel film, and production method thereof | SUMITOMO METAL MINING CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| CN-101194041-B | Coating liquid for nickel film formation, nickel film and method for producing same | SUMITOMO METAL MINING CO | 2010-12-15 | — | — | CN | disclosed |
| US-20090035472-A1 | Coating Liquid For Nickel Film Formation, Nickel Film, and Production Method Thereof | SUMITOMO METAL MINING CO., LTD. | 2009-02-05 | — | — | US | disclosed |
| CN-101194041-A | Coating liquid for nickel film formation, nickel film and method for producing same | SUMITOMO METAL MINING CO (JP) | 2008-06-04 | — | — | CN | disclosed |