Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.62 |
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.59 |
| ▸ | HPGD | P15428 | 1/20 | 0.59 |
| ▸ | MAPT | P10636 | 7/20 | 0.52 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.52 |
| ▸ | MEN1 | O00255 | 2/20 | 0.52 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.52 |
| ▸ | ATG4B | Q9Y4P1 | 1/20 | 0.52 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.48 |
| ▸ | NPC1 | O15118 | 3/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.46 |
| ▸ | GAA | P10253 | 3/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | HTT | P42858 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10813242 | 0.92 | ALDH1A1 (0.51) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL10968040 | 0.92 | ALDH1A1 (0.51) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL2357453 | 0.80 | ALDH1A1 (0.42) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL3216571 | 0.80 | ALDH1A1 (0.66) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL5398653 | 0.80 | L3MBTL1 (0.92) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL29757867 | 0.80 | L3MBTL1 (0.92) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL30043171 | 0.80 | L3MBTL1 (0.92) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL1204352 | 0.80 | L3MBTL1 (0.92) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| SCHEMBL395524 | 0.80 | L3MBTL1 (0.92) | ALDH1A1L3MBTL1HPGDMAPTKMT2A | |
| Acetic Acid SCHEMBL28410022 | 0.77 | L3MBTL1 (0.74) | ALDH1A1L3MBTL1HPGDMAPTKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1519972-B2 | COMPOSITIONS FOR PRODUCING AMINOPLAST PRODUCTS AND METHOD FOR PRODUCING PRODUCTS FROM THESE COMPOSITIONS | BOREALIS AGROLINZ MELAMINE (AT) | 2011-08-24 | — | — | EP | disclosed |
| EP-1519972-B1 | COMPOSITIONS FOR PRODUCING AMINOPLAST PRODUCTS AND METHOD FOR PRODUCING PRODUCTS FROM THESE COMPOSITIONS | AMI AGROLINZ MELAMINE INT GMBH (AT) | 2006-10-25 | — | — | EP | disclosed |
| EP-1519972-A1 | COMPOSITIONS FOR PRODUCING AMINOPLAST PRODUCTS AND METHOD FOR PRODUCING PRODUCTS FROM THESE COMPOSITIONS | AMI - Agrolinz Melamine International GmbH (AT) | 2005-04-06 | — | — | EP | disclosed |
| EP-1517933-A1 | METHOD FOR CURING AMINOPLASTS | AMI - Agrolinz Melamine International GmbH (AT) | 2005-03-30 | — | — | EP | disclosed |
| WO-2003106524-A1 | COMPOSITIONS FOR PRODUCING AMINOPLAST PRODUCTS AND METHOD FOR PRODUCING PRODUCTS FROM THESE COMPOSITIONS | AGROLINZ MELAMIN GMBH (AT) | 2003-12-24 | — | — | WO | disclosed |
| WO-2003106525-A1 | METHOD FOR CURING AMINOPLASTS | AGROLINZ MELAMIN GMBH (AT) | 2003-12-24 | — | — | WO | disclosed |
| US-5683857-A | Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion | NIPPON PAINT CO., LTD. (JP) | 1997-11-04 | — | — | US | disclosed |
| EP-0626620-B1 | Method for forming resist pattern | NIPPON PAINT CO LTD (JP) | 1996-10-09 | — | — | EP | disclosed |
| EP-0626620-A1 | Method for forming resist pattern | Nippon Paint Co., Ltd. (JP) | 1994-11-30 | — | — | EP | disclosed |
| EP-0232972-B1 | NEGATIVE PHOTORESIST COMPOSITIONS AND PROCESSES FOR PREPARING THERMALLY STABLE, NEGATIVE IMAGES USING THEM | ROHM AND HAAS COMPANY (US) | 1993-09-08 | — | — | EP | disclosed |
| US-5204225-A | Depositing actinic radiation sensitive aminoplast and phenoplast containing resin on substrate, baking, exposing to actinic radiation, developing | ROHM AND HAAS COMPANY (US) | 1993-04-20 | — | — | US | disclosed |
| US-5034304-A | Halogenated compositions for negative images | ROHM AND HAAS COMPANY (US) | 1991-07-23 | — | — | US | disclosed |
| EP-0232972-A2 | Negative photoresist compositions and processes for preparing thermally stable, negative images using them | ROHM AND HAAS COMPANY (US) | 1987-08-19 | — | — | EP | disclosed |
| EP-0139609-B1 | PROCESS FOR CURING ACID-CURABLE LACQUERS | CIBA-GEIGY AG (CH) | 1987-02-04 | — | — | EP | disclosed |
| EP-0139609-A1 | Process for curing acid-curable lacquers | CIBA-GEIGY AG (CH) | 1985-05-02 | — | — | EP | disclosed |