SCHEMBL23861546

SCHEMBL23861546

CC(c1ccccc1)(c1cc(O)c2ccccc2c1O)c1cc(O)c2ccccc2c1O

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ LMNA P02545 1/20 0.48
▸ HTT P42858 1/20 0.48
▸ ESR1 P03372 3/20 0.47
▸ ESR2 Q92731 3/20 0.47
▸ THRB P10828 1/20 0.44
▸ MCL1 Q07820 2/20 0.43
▸ KDM4E B2RXH2 1/20 0.43
▸ MEN1 O00255 1/20 0.43
▸ NSD2 O96028 1/20 0.43
▸ POLB P06746 1/20 0.43
▸ MAPT P10636 1/20 0.43
▸ KMT2A Q03164 1/20 0.43
▸ CYP2C9 P11712 2/20 0.41
▸ HSD17B10 Q99714 2/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP2D6 P10635 1/20 0.41
▸ HPGD P15428 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ HIF1A Q16665 1/20 0.41
▸ HKDC1 Q2TB90 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23861498 0.90 LMNA (0.46) LMNAHTTESR1ESR2THRB
SCHEMBL23861573 0.81 THRB (0.47) LMNAHTTESR1ESR2THRB
SCHEMBL7520146 0.81 LMNA (0.55) LMNAHTTTHRBMCL1KDM4E
SCHEMBL25710685 0.78 IDO1 (0.50) ESR1ESR2CYP2C9HSD17B10CYP1A2
SCHEMBL23861445 0.76 ESR1 (0.49) LMNAHTTESR1ESR2THRB
SCHEMBL23861564 0.75 KCNJ11 (0.42) LMNAHTTESR1ESR2THRB
SCHEMBL23861542 0.75 ESR1 (0.51) LMNAHTTESR1ESR2THRB
SCHEMBL7032993 0.73 LMNA (0.50) LMNAHTTTHRBMCL1KDM4E
SCHEMBL1410514 0.72 ALDH1A1 (0.60) LMNAHTTESR1ESR2KDM4E
SCHEMBL29688168 0.72 ALDH1A1 (0.60) LMNAHTTESR1ESR2KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11130724-B2 Compound, resin, composition, resist pattern formation method, and circuit pattern formation method MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2021-09-28 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11130724-B2 Compound, resin, composition, resist pattern formation method, and circuit pattern formation method RER1, NBAS, INTS9 LMNA 3097/4885HTT 2072/4885ESR1 713/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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