SCHEMBL23907132

SCHEMBL23907132

Oc1c(I)cc(OC2CCCCO2)cc1I

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 1/20 0.38
DHFR P00374 1/20 0.36
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35
KDM4C Q9H3R0 1/20 0.34
PTPN1 P18031 1/20 0.34
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
SLC6A3 Q01959 4/20 0.33
CYP2C9 P11712 1/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
MAOA P21397 1/20 0.33
TNK2 Q07912 3/20 0.32
TTR P02766 1/20 0.32
PDE4B Q07343 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23907117 0.94 HSD11B1 (0.35) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL23906803 0.85 DHFR (0.37) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL23907118 0.84 HSD11B1 (0.38) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL25633066 0.83 DHFR (0.34) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL16406637 0.78 HPGD (0.39) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL7523611 0.76 DHFR (0.40) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL23906802 0.76 PTPN1 (0.35) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL23907104 0.75 DHFR (0.37) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL23906796 0.75 PTPN1 (0.35) HSD11B1DHFRMEN1KMT2AKDM4C
SCHEMBL3500438 0.75 TNK2 (0.44) HSD11B1DHFRMEN1KMT2AKDM4C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-11675267-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
US-20210311392-A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2021-10-07 US disclosed