SCHEMBL242576

SCHEMBL242576

CCO[SiH2]C(c1ccccc1)c1ccccc1

nearest known ligand 0.40

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.40
POLB P06746 2/20 0.39
MMP8 P22894 1/20 0.36
TAAR1 Q96RJ0 4/20 0.35
HTR2A P28223 3/20 0.35
HRH1 P35367 2/20 0.35
TDP1 Q9NUW8 1/20 0.34
HTT P42858 1/20 0.34
L3MBTL1 Q9Y468 3/20 0.34
MEN1 O00255 1/20 0.34
KMT2A Q03164 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704988 0.83 LMNA (0.38) LMNAPOLBHTR2AHRH1HTT
SCHEMBL706996 0.80 LTA4H (0.43) LMNAPOLBTDP1L3MBTL1
SCHEMBL1314671 0.76 SLC6A3 (0.39) LMNAPOLBTAAR1HTR2AHRH1
SCHEMBL296868 0.75 LMNA (0.34) LMNAPOLBMMP8TAAR1HTR2A
SCHEMBL704150 0.75 KMT2A (0.40) LMNATAAR1HTR2AHRH1TDP1
SCHEMBL433140 0.74 DPP4 (0.39) LMNATAAR1HTR2AHRH1KMT2A
SCHEMBL1315147 0.74 ESR1 (0.45) LMNAPOLBHTR2AHRH1TDP1
SCHEMBL708761 0.72 HTR2A (0.39) LMNAPOLBMMP8TAAR1HTR2A
SCHEMBL705271 0.71 TAAR1 (0.37) LMNATAAR1L3MBTL1KMT2A
SCHEMBL21382040 0.71 HTT (0.40) LMNAPOLBMMP8TAAR1HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 429 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12331164-B2 Curable siloxane resin composition KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2025-06-17 US claimed
CN-115362203-B Moisture-curable non-yellowing clear compositions and methods of making the same 迈图高新材料公司 2024-07-16 CN claimed
US-20230106223-A1 MOISTURE-CURABLE NON-YELLOWING CLEAR COMPOSITION AND METHOD OF MAKING THEREOFROM MOMENTIVE PERFORMANCE MATERIALS INC. 2023-04-06 US claimed
US-20230078587-A1 CURABLE SILOXANE RESIN COMPOSITION KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-03-16 US claimed
CN-115362203-A Moisture-curable non-yellowing clear composition and preparation method thereof 迈图高新材料公司 2022-11-18 CN claimed
EP-4081585-A1 MOISTURE-CURABLE NON-YELLOWING CLEAR COMPOSITION AND METHOD OF MAKING THEREOFROM Momentive Performance Materials Inc. (US) 2022-11-02 EP claimed
WO-2021158370-A1 MOISTURE-CURABLE NON-YELLOWING CLEAR COMPOSITION AND METHOD OF MAKING THEREOFROM MOMENTIVE PERFORMANCE MATERIALS INC. (US) 2021-08-12 WO claimed
CN-108586748-A A kind of benzocyclobutene functionalization organosilicon polymer and its preparation method and application 复旦大学 2018-09-28 CN claimed
US-20130153263-A1 INORGANIC NANOFILLER, PARTIAL DISCHARGE RESISTANT ENAMELED WIRE INCLUDING THE SAME, AND PREPARING METHOD OF THE ENAMELED WIRE SEJONG UNIVERSITY INDUSTRY ACADEMY COOPERATION FOUNDATION (KR) 2013-06-20 US claimed
US-8039049-B2 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2011-10-18 US claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040816-A2 TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
EP-1436018-A1 NITRIC OXIDE-RELEASING COATED MEDICAL DEVICES AND METHOD OF PREPARING SAME THE GOVERNMENT OF THE UNITED STATES OF AMERICA, as represented by THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2004-07-14 EP claimed
WO-2003026717-A1 NITRIC OXIDE-RELEASING COATED MEDICAL DEVICES AND METHOD OF PREPARING SAME THE GOVERNMENT OF THE UNITED STATES OF AMERICA, REPRESENTED BY THE SECRETARY, DEPARTMENT OF HEALTH AND HUMAN SERVICES (US) 2003-04-03 WO claimed