Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | KIF11 | P52732 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 2/20 | 0.35 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.33 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA5A | P35218 | 1/20 | 0.32 |
| ▸ | CA9 | Q16790 | 1/20 | 0.32 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.31 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.31 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.30 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2437783 | 0.91 | TSHR (0.41) | TSHRALDH1A1KIF11CES1PTPN1 | |
| SCHEMBL10801908 | 0.87 | ALDH1A1 (0.40) | TSHRALDH1A1CA1CA2CA9 | |
| SCHEMBL47554 | 0.87 | ALDH1A1 (0.40) | TSHRALDH1A1CA1CA2CA9 | |
| Perflubutane SCHEMBL7058920 | 0.86 | TSHR (0.38) | TSHRALDH1A1KIF11CES1PTPN1 | |
| SCHEMBL12762137 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1CA1CA2CA9 | |
| SCHEMBL2058664 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1CA1CA2CA9 | |
| Fluoride Ion SCHEMBL10437963 | 0.83 | ALDH1A1 (0.39) | TSHRALDH1A1CA1CA2CA9 | |
| Methane SCHEMBL2440754 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1CA1CA2CA9 | |
| Bromide SCHEMBL60557 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1CA1CA2CA9 | |
| SCHEMBL126923 | 0.83 | ALDH1A1 (0.38) | TSHRALDH1A1CA1CA2CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | claimed |
| EP-2121783-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ Electronic Materials USA Corp. (US) | 2009-11-25 | — | — | EP | claimed |
| US-7601480-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-10-13 | — | — | US | claimed |
| EP-2102184-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2102156-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-09-23 | — | — | EP | claimed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | claimed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | claimed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | claimed |
| US-7491482-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-02-17 | — | — | US | claimed |
| WO-2008087549-A1 | POLYMERS USEFUL IN PHOTORESIST COMPOSITIONS AND COMPOSITIONS THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-07-24 | — | — | WO | claimed |
| US-20080153032-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-26 | — | — | US | claimed |
| US-7390613-B1 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2008-06-24 | — | — | US | claimed |
| WO-2008068617-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| WO-2008068610-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-06-12 | — | — | WO | claimed |
| US-20080131811-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| US-20080131810-A1 | Photoactive Compounds | MERCK PATENT GMBH (DE) | 2008-06-05 | — | — | US | claimed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | claimed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | claimed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | claimed |
| EP-2384457-B1 | COATING COMPOSITIONS | MERCK PATENT GMBH (DE) | 2022-07-06 | — | — | EP | disclosed |
| US-9146467-B2 | Coating compositions | MERCK PATENT GMBH (DE) | 2015-09-29 | — | — | US | disclosed |
| US-20130236833-A1 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-09-12 | — | — | US | disclosed |
| US-8252503-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2012-08-28 | — | — | US | disclosed |
| EP-2384457-A2 | COATING COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2011-11-09 | — | — | EP | disclosed |
| EP-2078028-B1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA (US) | 2011-09-07 | — | — | EP | disclosed |
| EP-2197924-A2 | POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS | AZ Electronic Materials USA Corp. (US) | 2010-06-23 | — | — | EP | disclosed |
| WO-2010055406-A2 | COATING COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2010-05-20 | — | — | WO | disclosed |
| EP-2111567-A2 | PHOTORESIST COMPOSITION | AZ Electronic Materials USA Corp. (US) | 2009-10-28 | — | — | EP | disclosed |
| EP-2078028-A1 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2009-07-15 | — | — | EP | disclosed |
| US-20090087782-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2009-04-02 | — | — | US | disclosed |
| WO-2009027794-A2 | POLYMERS FOR USE IN PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-03-05 | — | — | WO | disclosed |
| US-20090053652-A1 | PHOTORESIST COMPOSITIONS | MERCK PATENT GMBH (DE) | 2009-02-26 | — | — | US | disclosed |
| WO-2008096263-A2 | PHOTORESIST COMPOSITION | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-08-14 | — | — | WO | disclosed |
| EP-1915360-A2 | PHOTOACTIVE COMPOUNDS | AZ Electronic Materials USA Corp. (US) | 2008-04-30 | — | — | EP | disclosed |
| WO-2008041123-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2008-04-10 | — | — | WO | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
| WO-2007007175-A2 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2007-01-18 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080131811-A1 | Photoactive Compounds | PRXL2A, PRDX2, AOC2 | TSHR 3855/4885ALDH1A1 1613/4885KIF11 3215/4885 |
| US-20080131810-A1 | Photoactive Compounds | CRY2, AOC2, AFF2 | TSHR 3997/4885ALDH1A1 2000/4885KIF11 2782/4885 |
| US-20080153032-A1 | Photoactive Compounds | SUN2, CRY2, SCO2 | TSHR 4095/4885ALDH1A1 3915/4885KIF11 3797/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.