SCHEMBL2489383

SCHEMBL2489383

C[N+](C)(C)c1ccc([N+](C)(C)C)cc1

nearest known ligand 0.62

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
APOBEC3A P31941 1/20 0.62
APOBEC3G Q9HC16 1/20 0.62
ACHE P22303 5/20 0.46
CA12 O43570 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL6368015 0.96 APOBEC3A (0.59) APOBEC3AAPOBEC3GACHECA12CA9
Iodide SCHEMBL6373433 0.96 APOBEC3A (0.69) APOBEC3AAPOBEC3GACHECA12CA9
SCHEMBL13567373 0.89 APOBEC3A (0.53) APOBEC3AAPOBEC3GACHE
SCHEMBL841700 0.86 ACHE (0.53) APOBEC3AAPOBEC3GACHECA9
SCHEMBL5853872 0.83 LMNA (0.50) APOBEC3AAPOBEC3GACHE
SCHEMBL15965113 0.83 APOBEC3A (0.48) APOBEC3AAPOBEC3GACHE
SCHEMBL1921139 0.83 ACHE (0.50) APOBEC3AAPOBEC3GACHECA12CA9
SCHEMBL16673349 0.83 APOBEC3A (0.48) APOBEC3AAPOBEC3GACHE
SCHEMBL7162015 0.83 APOBEC3A (0.48) APOBEC3AAPOBEC3GACHE
Hydrochloric Acid SCHEMBL1508422 0.83 ACHE (0.50) APOBEC3AAPOBEC3GACHECA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4065513-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF CORPORATION (US) 2022-10-05 EP claimed
WO-2022173419-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF CORPORATION (US) 2022-08-18 WO claimed
US-20250382189-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF MOBILE EMISSIONS CATALYSTS LLC (US) 2025-12-18 US disclosed
US-12428305-B2 Zeolite structure synthesized using mixtures of organic structure directing agents BASF MOBILE EMISSIONS CATALYSTS LLC (US) 2025-09-30 US disclosed
US-20230348287-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF MOBILE EMISSIONS CATALYSTS LLC 2023-11-02 US disclosed
US-20230348287-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF MOBILE EMISSIONS CATALYSTS LLC 2023-11-02 US disclosed
EP-4065513-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF CORPORATION (US) 2022-10-05 EP disclosed
WO-2022173419-A1 ZEOLITE STRUCTURE SYNTHESIZED USING MIXTURES OF ORGANIC STRUCTURE DIRECTING AGENTS BASF CORPORATION (US) 2022-08-18 WO disclosed
US-8409467-B2 Polishing liquid for semiconductor integrated circuit FUJIFILM CORPORATION (JP) 2013-04-02 US disclosed
US-8404146-B2 Polishing liquid and polishing method FUJIFILM CORPORATION (JP) 2013-03-26 US disclosed
US-8372304-B2 Polishing slurry FUJIFILM CORPORATION (JP) 2013-02-12 US disclosed
US-20090311864-A1 Polishing slurry FUJIFILM CORPORATION (JP) 2009-12-17 US disclosed
US-20090311864-A1 Polishing slurry FUJIFILM CORPORATION (JP) 2009-12-17 US disclosed
US-20090274944-A1 METHOD FOR PRODUCING POLYMER ELECTROLYTE MEMBRANE, POLYMER ELECTROLYTE MEMBRANE AND DIRECT METHANOL FUEL CELL SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-11-05 US disclosed
US-20090215270-A1 Polishing liquid and polishing method FUJIFILM CORPORATION (JP) 2009-08-27 US disclosed
US-20090087989-A1 POLISHING LIQUID AND POLISHING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2009-04-02 US disclosed
US-20090078908-A1 POLISHING LIQUID FUJIFILM CORPORATION (JP) 2009-03-26 US disclosed
EP-2009724-A1 METHOD FOR PRODUCING POLYMER ELECTROLYTE MEMBRANE, POLYMER ELECTROLYTE MEMBRANE AND DIRECT METHANOL FUEL CELL Sumitomo Chemical Company, Limited (JP) 2008-12-31 EP disclosed
US-20080203354-A1 POLISHING LIQUID FUJIFILM CORPORATION (JP) 2008-08-28 US disclosed
US-20070020479-A1 Luminescent-polymer composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-01-25 US disclosed