⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24901091 | 0.80 | FABP7 (0.41) | — | |
| SCHEMBL24667221 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL24901040 | 0.78 | POLB (0.31) | — | |
| SCHEMBL24179235 | 0.76 | ELANE (0.40) | — | |
| SCHEMBL24901090 | 0.74 | KMT2A (0.38) | — | |
| SCHEMBL24901181 | 0.72 | TSHR (0.44) | — | |
| SCHEMBL196363 | 0.72 | TSHR (0.47) | — | |
| SCHEMBL24901031 | 0.70 | CES2 (0.37) | — | |
| SCHEMBL27259497 | 0.69 | ELANE (0.44) | — | |
| SCHEMBL24946068 | 0.68 | FAAH (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230023593-A1 | POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-26 | — | — | US | disclosed |
| US-20230019681-A1 | POSITIVE RESIST MATERIAL AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-01-19 | — | — | US | disclosed |