SCHEMBL24901090

SCHEMBL24901090

O=C(Oc1cccc(I)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
ESR1 P03372 2/20 0.35
ESR2 Q92731 2/20 0.35
PDK1 Q15118 1/20 0.35
PDK2 Q15119 1/20 0.35
PDK3 Q15120 1/20 0.35
PDK4 Q16654 1/20 0.35
CYP3A4 P08684 1/20 0.34
LMNA P02545 1/20 0.34
NPSR1 Q6W5P4 2/20 0.33
POLB P06746 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
ALDH1A1 P00352 1/20 0.32
PRSS1 P07477 1/20 0.32
ACR P10323 1/20 0.32
ELANE P08246 1/20 0.32
SLC6A2 P23975 1/20 0.32
SLC6A4 P31645 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24901075 0.81 BCHE (0.43) KMT2AMEN1NPSR1POLBALDH1A1
SCHEMBL24179235 0.80 ELANE (0.40) ALDH1A1ELANE
SCHEMBL24142221 0.79 ALDH1A1 (0.46) PDK1PDK2PDK3PDK4NPSR1
SCHEMBL27440409 0.76 ALDH1A1 (0.34) KMT2AMEN1PDK1PDK2PDK3
SCHEMBL24901039 0.74
SCHEMBL24177998 0.74 IDO1 (0.46) KMT2AMEN1PDK1PDK2PDK3
SCHEMBL24901099 0.73 CES2 (0.37) ESR1ESR2POLBNPC1ALDH1A1
SCHEMBL25468124 0.73 NPC1 (0.42) KMT2AMEN1ESR1ESR2CYP3A4
SCHEMBL20489174 0.72 KMT2A (0.73) KMT2AMEN1ESR1ESR2CYP3A4
SCHEMBL1513774 0.72 LMNA (0.63) KMT2AMEN1CYP3A4LMNANPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR KMT2A 3819/4885MEN1 4466/4885ESR1 1401/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.