SCHEMBL24901075

SCHEMBL24901075

O=C(Oc1cccc(Cl)c1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.43
TRPA1 O75762 1/20 0.41
POLB P06746 1/20 0.40
OGG1 O15527 1/20 0.40
RXRA P19793 1/20 0.39
RXRB P28702 1/20 0.39
RXRG P48443 1/20 0.39
FKBP1A P62942 1/20 0.39
KDM4E B2RXH2 3/20 0.38
USP2 O75604 1/20 0.38
ALDH1A1 P00352 1/20 0.38
ALOX15 P16050 1/20 0.38
NPSR1 Q6W5P4 1/20 0.38
KMT2A Q03164 2/20 0.38
MEN1 O00255 1/20 0.38
FAAH O00519 1/20 0.38
AR P10275 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24901090 0.81 KMT2A (0.38) POLBALDH1A1NPSR1KMT2AMEN1
SCHEMBL24901072 0.80 ELANE (0.51) KMT2AMEN1
SCHEMBL24142221 0.79 ALDH1A1 (0.46) POLBKDM4EALDH1A1ALOX15NPSR1
SCHEMBL24901099 0.77 CES2 (0.37) POLBALDH1A1
SCHEMBL27440409 0.76 ALDH1A1 (0.34) POLBALDH1A1NPSR1KMT2AMEN1
SCHEMBL18697294 0.75 BCHE (0.53) BCHEOGG1RXRARXRBRXRG
SCHEMBL8701098 0.75 POLB (0.50) BCHEPOLBOGG1RXRARXRB
SCHEMBL5916715 0.75 BCHE (0.51) BCHEOGG1RXRARXRBRXRG
SCHEMBL7932475 0.75 BCHE (0.51) BCHEOGG1RXRARXRBRXRG
SCHEMBL24901042 0.74 HCAR2 (0.52) RXRARXRBRXRGKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR BCHE 4356/4885TRPA1 744/4885POLB 31/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.