SCHEMBL24901182

SCHEMBL24901182

O=C(Oc1ccc(SC(F)(F)F)cc1)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPRZ1 P23471 3/20 0.44
ALDH1A1 P00352 2/20 0.40
KDM4E B2RXH2 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MMP1 P03956 1/20 0.40
MMP2 P08253 1/20 0.40
MMP3 P08254 1/20 0.40
MMP9 P14780 1/20 0.40
MMP8 P22894 1/20 0.40
MMP13 P45452 1/20 0.40
MMP14 P50281 1/20 0.40
KIF11 P52732 1/20 0.40
KCNK2 O95069 4/20 0.39
KCNK10 P57789 3/20 0.39
ELANE P08246 2/20 0.37
LMNA P02545 4/20 0.37
TRPV1 Q8NER1 1/20 0.36
MAPT P10636 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
PTPN1 P18031 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24142228 0.79 ELANE (0.41) ALDH1A1KDM4EKIF11ELANESMN1; SMN2
SCHEMBL16828781 0.77 LMNA (0.52) PTPRZ1ALDH1A1KDM4ETDP1KIF11
SCHEMBL24179235 0.77 ELANE (0.40) ALDH1A1KIF11ELANETRPV1GAA
SCHEMBL26163156 0.77 LMNA (0.52) ALDH1A1ELANELMNANPSR1GAA
SCHEMBL24901072 0.77 ELANE (0.51) ELANEMAPT
SCHEMBL24901178 0.77 EPHX2 (0.49) ALDH1A1TDP1ELANETRPV1MAPT
SCHEMBL24142316 0.77 KIF11 (0.54) ALDH1A1KIF11ELANETRPV1
SCHEMBL24142221 0.77 ALDH1A1 (0.46) ALDH1A1KDM4ETDP1ELANEMAPT
SCHEMBL24901127 0.76 PTPRZ1 (0.51) PTPRZ1ALDH1A1KDM4ETDP1MMP1
SCHEMBL24901183 0.73 F2 (0.43) ALDH1A1KDM4EMMP2LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed
US-20230019681-A1 POSITIVE RESIST MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230023593-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS HNRNPU, EWSR1, HNRNPR PTPRZ1 1708/4885ALDH1A1 4856/4885KDM4E 4103/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.